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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 7 — Apr. 4, 2005
  • pp: 2605–2610

Photosensitivity of germanosilicate fibers using 213nm, picosecond Nd:YAG radiation

Stavros Pissadakis and Maria Konstantaki  »View Author Affiliations


Optics Express, Vol. 13, Issue 7, pp. 2605-2610 (2005)
http://dx.doi.org/10.1364/OPEX.13.002605


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Abstract

The photosensitivity of Ge-doped silica fiber using 213nm, 150ps Nd:YAG radiation, is presented here for first time. Refractive index changes greater than 10-3 were measured in Bragg grating reflectors recorded in a low-Ge content fiber, using average intensities of ≈0.35GW/cm2. Grating growth curves for 213nm inscription wavelength are presented and discussed, in comparison with data obtained using 248nm excimer laser radiation. The experimental results presented denote that contrary to the recording using longer laser wavelengths and pulse durations, the grating inscription employing 213nm picosecond radiation is dominated by a two-photon absorption, which role becomes prominent in long-exposures.

© 2005 Optical Society of America

OCIS Codes
(060.2290) Fiber optics and optical communications : Fiber materials
(060.2340) Fiber optics and optical communications : Fiber optics components
(160.6030) Materials : Silica
(230.1480) Optical devices : Bragg reflectors

ToC Category:
Research Papers

History
Original Manuscript: February 28, 2005
Revised Manuscript: March 22, 2005
Published: April 4, 2005

Citation
Stavros Pissadakis and Maria Konstantaki, "Photosensitivity of germanosilicate fibers using 213nm, picosecond Nd:YAG radiation," Opt. Express 13, 2605-2610 (2005)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-7-2605


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