Sub-nanometer metrology of optical wafers using an angle-scanned Fabry-Perot interferometer
Optics Express, Vol. 14, Issue 1, pp. 114-119 (2006)
http://dx.doi.org/10.1364/OPEX.14.000114
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Abstract
An rms measurement repeatability of ≤0.07 nm and a reproducibility of ≤0.16 are reported from a series of thickness measurements made on a 280 μm thick, 37.5 mm diameter lithium niobate wafer. The measurements were taken on a custom made metrology rig based on accurate rotation of a Fabry-Perot etalon structure in a collimated beam from a wavelength stabilized Helium Neon laser. The measurements were made on different days with the wafer in three different orientations.
© 2006 Optical Society of America
OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(220.0220) Optical design and fabrication : Optical design and fabrication
ToC Category:
Instrumentation, Measurement, and Metrology
Citation
John Arkwright, David Farrant, and Jun Zhang, "Sub-nanometer metrology of optical wafers using an angle-scanned Fabry-Perot interferometer," Opt. Express 14, 114-119 (2006)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-14-1-114
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References
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