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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 1 — Jan. 9, 2006
  • pp: 114–119

Sub-nanometer metrology of optical wafers using an angle-scanned Fabry-Perot interferometer

John Arkwright, David Farrant, and Jun Zhang  »View Author Affiliations

Optics Express, Vol. 14, Issue 1, pp. 114-119 (2006)

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An rms measurement repeatability of ≤0.07 nm and a reproducibility of ≤0.16 are reported from a series of thickness measurements made on a 280 μm thick, 37.5 mm diameter lithium niobate wafer. The measurements were taken on a custom made metrology rig based on accurate rotation of a Fabry-Perot etalon structure in a collimated beam from a wavelength stabilized Helium Neon laser. The measurements were made on different days with the wafer in three different orientations.

© 2006 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(220.0220) Optical design and fabrication : Optical design and fabrication

ToC Category:
Instrumentation, Measurement, and Metrology

John Arkwright, David Farrant, and Jun Zhang, "Sub-nanometer metrology of optical wafers using an angle-scanned Fabry-Perot interferometer," Opt. Express 14, 114-119 (2006)

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