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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 1 — Jan. 9, 2006
  • pp: 260–269

Analysis of the influence of spherical aberration from focusing through a dielectric slab in quantitative nonlinear optical susceptibility measurements using third-harmonic generation

Rajesh S. Pillai, G.J. Brakenhoff, and M. Müller  »View Author Affiliations

Optics Express, Vol. 14, Issue 1, pp. 260-269 (2006)

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The third-order nonlinear susceptibility (χ(3)) can be measured quantitatively using third-harmonic generation (THG) from two different interfaces. For the first time it is demonstrated both in experiments and theory that the magnitude of the THG signals from the two interfaces is not only determined by material properties (refractive index and χ(3)), but also by optical aberrations. It is found that this method of χ(3) determination can be applied without additional correction factors only for focusing conditions with a numerical aperture (NA) ≤ 0.35. The implications for general application of THG in three-dimensional microscopy are discussed.

© 2006 Optical Society of America

OCIS Codes
(080.1010) Geometric optics : Aberrations (global)
(180.6900) Microscopy : Three-dimensional microscopy
(190.4160) Nonlinear optics : Multiharmonic generation
(190.4410) Nonlinear optics : Nonlinear optics, parametric processes
(190.4720) Nonlinear optics : Optical nonlinearities of condensed matter

ToC Category:
Nonlinear Optics

Virtual Issues
Vol. 1, Iss. 2 Virtual Journal for Biomedical Optics

Rajesh S. Pillai, G. J. Brakenhoff, and M. Müller, "Analysis of the influence of spherical aberration from focusing through a dielectric slab in quantitative nonlinear optical susceptibility measurements using third-harmonic generation," Opt. Express 14, 260-269 (2006)

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