Spectrally resolved white–light phase–shifting interference microscopy for thickness–profile measurements of transparent thin film layers on patterned substrates
Optics Express, Vol. 14, Issue 11, pp. 4662-4667 (2006)
http://dx.doi.org/10.1364/OE.14.004662
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Abstract
We describe how spectrally-resolved white-light phase-shifting interference microscopy with a windowed 8-step algorithm can be used for rapid and accurate measurements of the thickness profile of transparent thin film layers with a wide range of thicknesses deposited upon patterned structures exhibiting steps and discontinuities. An advantage of this technique is that it can be implemented with readily available hardware.
© 2006 Optical Society of America
OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(120.6200) Instrumentation, measurement, and metrology : Spectrometers and spectroscopic instrumentation
(240.0310) Optics at surfaces : Thin films
ToC Category:
Instrumentation, Measurement, and Metrology
History
Original Manuscript: March 7, 2006
Revised Manuscript: May 13, 2006
Manuscript Accepted: May 17, 2006
Published: May 29, 2006
Citation
Sanjit K. Debnath, Mahendra P. Kothiyal, Joanna Schmit, and Parameswaran Hariharan, "Spectrally resolved white–light phase–shifting interference microscopy for thickness–profile measurements of transparent thin film layers on patterned substrates," Opt. Express 14, 4662-4667 (2006)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-14-11-4662
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