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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 13 — Jun. 26, 2006
  • pp: 6001–6010

Overlay measurement using angular scatterometer for the capability of integrated metrology

Chun-Hung Ko and Yi-Sha Ku  »View Author Affiliations


Optics Express, Vol. 14, Issue 13, pp. 6001-6010 (2006)
http://dx.doi.org/10.1364/OE.14.006001


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Abstract

Angular scatterometry, which has the advantage of good measurement precision, is an optical measurement technology based on the analysis of light scattered from periodic features, such as a linear grating, and is proposed as an alternative solution for overlay metrology. We present overlay measurements using an angular scatterometer and a bright-field microscope. A theoretical library based on rigorous coupled wave theory was created, and the reflected signatures measured by angular scatterometer were matched to the library to obtain structure parameters, including overlay, critical dimension (CD), and sidewall angle at the same time. The results reveal that angular scatterometer has a good precision and low tool-induced shift for overlay measurements, and has the potential for integrated metrology.

© 2006 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.3940) Instrumentation, measurement, and metrology : Metrology

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: March 16, 2006
Revised Manuscript: June 9, 2006
Manuscript Accepted: June 9, 2006
Published: June 26, 2006

Citation
Chun-Hung Ko and Yi-Sha Ku, "Overlay measurement using angular scatterometer for the capability of integrated metrology," Opt. Express 14, 6001-6010 (2006)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-14-13-6001


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References

  1. C. P. Ausschnitt, "A New Approach to Pattern Metrology," Proc. SPIE 5375, 51-65 (2004). [CrossRef]
  2. K. Lensing, C. Miller, G. Chudleigh, B. Swain, M. Laughery, A. Viswanathan, "Scatteromtry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," Proc. SPIE 5375, 307-316 (2004). [CrossRef]
  3. G. P. Kota, J. Luque, V. Vahedi, A. Khathuria, T. Dziura, A. Levy, "Advanced process control for polysilicon gate teching using integrated optical CD metrology," Proc. SPIE 5044, 90-96 (2003). [CrossRef]
  4. D. S. L. Mui, H. Sasano, W. Liu, J. Yamartino, A. Skumanich, "In-tool process control for advanced patterning based on integrated metrology," Proc. SPIE 5378, 10-17 (2004). [CrossRef]
  5. C. J. Raymond, M. R. Murnance, S. L. Prins, S. S. H. Naqvi, JohnR. McNeil, J. W. Hosch, "Multi-parameter CD measurement using scatterometry," Proc. SPIE 2725, 698-709 (1996). [CrossRef]
  6. C. J. Raymond, M Littau, B Youn, C. J. Sohn, J. A. Kim, Y. S. Kang, "Applications of angular scatterometry for the measurement for multiply-periodic features," Proc. SPIE 5038, 577-584 (2003). [CrossRef]
  7. M. G. Moharam, T. K. Gaylord, "Rigorous coupled-wave analysis of planar-grating diffraction," J. Opt. Soc. Am., 71, 811-818 (1981). [CrossRef]
  8. M. G. Moharam, E. B. Grann, D. A. Pomment, "Formualtion for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A, 12, 1068-1076 (1995). [CrossRef]
  9. N. Chateau, J. P. Hugonin, "Algorithm for the rigorous coupled-wave analysis of grating diffraction," J. Opt. Soc. Am. A, 11, 1321-1331 (1994). [CrossRef]
  10. W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. Boef, M. Schaar, A. Hunter," A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE 5038, 200-207 (2003). [CrossRef]
  11. H. T. Huang, G. Rafhavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheung, M. Miyagi, B. Singh, "Scatterometry-Based Overlay Metrology," Proc. SPIE 5038, 126-137 (2003). [CrossRef]

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