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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 18 — Sep. 4, 2006
  • pp: 8360–8366

Nanoindentation and birefringence measurements on fused silica specimen exposed to low-energy femtosecond pulses

Yves Bellouard, Tristan Colomb, Christian Depeursinge, Mark Dugan, Ali A. Said, and Philippe Bado  »View Author Affiliations


Optics Express, Vol. 14, Issue 18, pp. 8360-8366 (2006)
http://dx.doi.org/10.1364/OE.14.008360


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Abstract

Femtosecond laser pulses used in a regime below the ablation threshold have two noticeable effects on Fused Silica (a-SiO2): they locally increase the material refractive index and modify its HF etching selectivity. The nature of the structural changes induced by femtosecond laser pulses in fused silica is not fully understood. In this paper, we report on nanoindentation and birefringence measurements on fused silica exposed to low-energy femtosecond laser pulses. Our findings further back the hypothesis of localized densification effect even at low energy regime.

© 2006 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(230.1150) Optical devices : All-optical devices
(230.7370) Optical devices : Waveguides
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors

ToC Category:
Optical Devices

History
Original Manuscript: July 12, 2006
Revised Manuscript: August 18, 2006
Manuscript Accepted: August 22, 2006
Published: September 1, 2006

Citation
Yves Bellouard, Tristan Colomb, Christian Depeursinge, Mark Dugan, Ali A. Said, and Philippe Bado, "Nanoindentation and birefringence measurements on fused silica specimen exposed to low-energy femtosecond pulses," Opt. Express 14, 8360-8366 (2006)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-14-18-8360


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References

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