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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 19 — Sep. 18, 2006
  • pp: 8482–8491

Scatterometry-based metrology with feature region signatures matching

Yi-Sha Ku, Shih-Chun Wang, Deh-Ming Shyu, and Nigel Smith  »View Author Affiliations


Optics Express, Vol. 14, Issue 19, pp. 8482-8491 (2006)
http://dx.doi.org/10.1364/OE.14.008482


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Abstract

Scatterometry takes advantage of the sensitivity exhibited by optical diffraction from periodic structures, and hence is an efficient technique for lithographic process monitoring. A feature region measurement algorithm has been developed to extract accurately and quickly the relevant constitutive parameters from diffraction data. It is a method for efficiently determining grating structure by seeking the reflectance at some angles contains more information about the structure of the surface relief profile than the reflectance at other angles in a library data match process. The number of measurements and size of signature matching library will be reduced in a great percentage by performing the feature region algorithm.

© 2006 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.3940) Instrumentation, measurement, and metrology : Metrology

ToC Category:
Diffraction and Gratings

History
Original Manuscript: June 2, 2006
Revised Manuscript: July 27, 2006
Manuscript Accepted: August 29, 2006
Published: September 18, 2006

Citation
Yi-Sha Ku, Shih-Chun Wang, Deh-Ming Shyu, and Nigel Smith, "Scatterometry-based metrology with feature region signatures matching," Opt. Express 14, 8482-8491 (2006)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-14-19-8482


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References

  1. C. H. Ko, Y. S. Ku, N. P. Smith, D. M. Shyu, S. C. Wang and S. H. Lu, "Comparisons of overlay measurement using conventional bright-field microscope and angular scatterometer," in Metrology, Inspection, and Process Control for Microlithography XIX, R. M. Silver, ed., Proc. SPIE 5752, 987-966 (2005). [CrossRef]
  2. C. M Ke, S. S. Yu, Y. H. Wang, Y. J. Chou, J. H. Chen, B. H. Lee, H. Y. Chu, H. T. Lin, T. S. Gau, C. H. Lin, Y. C. Ku and B. J. Lin, "90 nm Lithography Process Characterization using ODP Scatterometry Technology," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver; ed., Proc. SPIE 5375, 597-604 (2004). [CrossRef]
  3. M. Littau, C. J. Raymond, C Gould, and C. Gambill, "Novel implementations of scatterometry for lithography process control," in Metrology, Inspection, and Process Control for Microlithography XVI, D. J. Herr, ed., Proc. SPIE 4689, 506-516 (2002). [CrossRef]
  4. J. A. Kim, S. J. Kim, S. B. Chin, S. H. Oh, D. Goo, S. J. Lee, S. G. Woo, H. K. Cho, W. S. Han, J. T. Moon, C. J. Raymond, M. E. Littau, B. Youn, and C. J. Sohn, "Successful application of angular scatterometry to process control in sub-100-nm DRAM device," in Metrology, Inspection, and Process Control for Microlithography XVIII, R. M. Silver; ed., Proc. SPIE. 5375, 541-549 (2004). [CrossRef]
  5. W. Yang, R. L. Webb, S. Rabello, J. Hu, J. Y. Lin, J. Heaton, M. Dusa, A. de Boef, M. van der Schaar, and A. Hunter, "A novel diffraction based spectroscopic method for overlay metrology," in Metrology, Inspection, and Process Control for Microlithography XVII, D. J. Herr, ed., Proc. SPIE. 5038, 200-207 (2003). [CrossRef]
  6. H. T. Huang, G. Raghavendra, A. Sezginer, K. Johnson, F. Stanke, M. Zimmerman, C. Cheng, M. Miyagi, and B. Singh, "Scatterometry-Based Overlay Metrology," in Metrology, Inspection, and Process Control for Microlithography XVII, D. J. Herr, ed., Proc. SPIE 5038, 126-137 (2003). [CrossRef]
  7. J. Opsal, H. Chu, Y. Wen, Y. C. Chang and G. Li, "Fundamental solution for real-time optical CD metrology," in Metrology, Inspection, and Process Control for Microlithography XVI, D. J. Herr, ed., Proc. SPIE 4689, 163-176 (2002). [CrossRef]
  8. E. M. Drege, J. A. Read and D. M. Byrne, "Linearized inversion of scatterometric data to obtain surface profile information," Opt. Eng. 41, 225-236 (2002). [CrossRef]

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