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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 20 — Oct. 2, 2006
  • pp: 9544–9550

Nonlinear enhancement of femtosecond laser ablation efficiency by hybridization with nanosecond laser

J. S. Yahng, B. H. Chon, C. H. Kim, S. C. Jeoung, and H. R. Kim  »View Author Affiliations

Optics Express, Vol. 14, Issue 20, pp. 9544-9550 (2006)

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Synchronization of femtosecond laser with nanosecond (~250 ns) laser results in a large enhancement in laser ablation efficiency of the Si wafer 12 times more than that with an independent laser exposure. Transient changes in the status of target material due to the proceeding nanosecond laser increase the femtosecond laser ablation efficiency.

© 2006 Optical Society of America

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(140.7090) Lasers and laser optics : Ultrafast lasers

ToC Category:
Ultrafast Optics

Original Manuscript: June 30, 2006
Revised Manuscript: September 18, 2006
Manuscript Accepted: September 22, 2006
Published: October 2, 2006

J. S. Yahng, B. H. Chon, C. H. Kim, S. C. Jeoung, and H. R. Kim, "Nonlinear enhancement of femtosecond laser ablation efficiency by hybridization with nanosecond laser," Opt. Express 14, 9544-9550 (2006)

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  1. N. Bärsch, K. Körber, A. Ostendorf, and K. H. Tönshoff, "Ablation and cutting of planar silicon devices using femtosecond laser pulses," Appl. Phys. A 77, 237-242 (2003).
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  29. J. S. Yahng, J. R. Nam, and S. C. Jeoung are preparing a manuscript to be called "Temperature dependence of ultrafast laser ablation threshold of crystalline silicone."
  30. D. J. Hwang, C. P. Grigoropoulos, and T. Y. Choi, "Efficiency of silicon micromachining by femtosecond laser pulses in ambient air," J. Appl. Phys. 99, 083101 (2006). [CrossRef]

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