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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 21 — Oct. 16, 2006
  • pp: 9564–9569

Immersion diffractometry for determining nanoscale grating pitch

Sheng-Hua Lu, Li-Cheng Tseng, Ching-Fen Kao, Shang-Peng Pan, and Liang-Chih Chang  »View Author Affiliations


Optics Express, Vol. 14, Issue 21, pp. 9564-9569 (2006)
http://dx.doi.org/10.1364/OE.14.009564


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Abstract

The laser diffractometer is an effective instrument for calibrating pitch standard of a grating structure. A conventional diffractometer based on the Littrow configuration cannot measure a grating whose pitch is less than half of the laser wavelength when the diffractometer is operated in the atmosphere. This study proposes an immersion diffractometer to raise the refractive index of the environment. Thus the new approach can overcome the limit of one-half wavelength. A 288 nm grating was measured using an immersion diffractometer with a 633 nm laser and using a conventional diffractometer with a 543 nm laser to demonstrate the feasibility and effectiveness of the proposed technology. The difference between the pitches obtained by these two methods is around 0.05 nm.

© 2006 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.3940) Instrumentation, measurement, and metrology : Metrology

ToC Category:
Diffraction and Gratings

History
Original Manuscript: August 7, 2006
Revised Manuscript: September 27, 2006
Manuscript Accepted: September 28, 2006
Published: October 16, 2006

Citation
Sheng-Hua Lu, Li-Cheng Tseng, Ching-Fen Kao, Shang-Peng Pan, and Liang-Chih Chang, "Immersion diffractometry for determining nanoscale grating pitch," Opt. Express 14, 9564-9569 (2006)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-14-21-9564


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References

  1. M. Tortonese, J. Prochazka, P. Konicek, J. Schneir, and I. R. Smith, "100 nm pitch standard characterization for metrology applications," Proc. SPIE 4689, 558-564 (2002). [CrossRef]
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