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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 21 — Oct. 16, 2006
  • pp: 9902–9908

Contact optical nanolithography using nanoscale C-shaped apertures

Liang Wang, Eric X. Jin, Sreemanth M. Uppuluri, and Xianfan Xu  »View Author Affiliations


Optics Express, Vol. 14, Issue 21, pp. 9902-9908 (2006)
http://dx.doi.org/10.1364/OE.14.009902


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Abstract

C-shaped ridge apertures are used in contact nanolithography to achieve nanometer scale resolution. Lithography results demonstrated that holes as small as 60 nm can be produced in the photoresist by illuminating the apertures with a 355 nm laser beam. Experiments are also performed using comparable square and rectangular apertures. Results show enhanced transmission and light concentration of C apertures compared to the apertures with regular shapes. Finite difference time domain simulations are used to design the apertures and explain the experimental results.

© 2006 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(230.7390) Optical devices : Waveguides, planar

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: June 27, 2006
Revised Manuscript: August 25, 2006
Manuscript Accepted: September 28, 2006
Published: October 16, 2006

Citation
Liang Wang, Eric X. Jin, Sreemanth M. Uppuluri, and Xianfan Xu, "Contact optical nanolithography using nanoscale C-shaped apertures," Opt. Express 14, 9902-9908 (2006)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-14-21-9902


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