The bulk scattering of synthetic fused silica for 193 nm lithography was investigated using an instrument for high-sensitive total and angle resolved scattering measurements at 193 nm. Bulk scattering coefficients α between 0.6×10^-3 and 1.7×10^-3 cm^-1 (base e) depending on the hydroxyl (OH) content and fictive temperature of the samples were measured using a total scattering (TS) technique. The results are interpreted with regard to a model which relates scattering in fused silica to structural disorder in the material. From angle resolved scatter (ARS) measurements at 193 nm, a Rayleigh type scattering distribution was found. Using TS and ARS at 633 nm, 532 nm, and 325 nm in addition to the results at 193 nm, wavelength scaling ~n⁸/λ⁴ as predicted by theory is obtained. Thus, the model is demonstrated to hold from the visible spectral range down to the deep ultraviolet.

© 2006 Optical Society of America

1. J. Schroeder, R. Mohr, P. B. Macedo, C. J. Montrose, "Rayleigh and Brillouin Scattering in K2O-SiO2 Glasses," J. Am. Ceram. Soc. 56, 510-514 (1973) [CrossRef]
2. D.A. Pinnow, T.C. Rich, F.W. Ostermayer, Jr., and M. DiDomenico, Jr., "Fundamental optical attenuation limits in the liquid and glassy state with application to fiber optical waveguide materials," Appl. Phys. Lett. 22, 527-529 (1973) [CrossRef]
3. R. Olshansky, "Propagation in glass optical waveguides," Rev. Mod. Phys. 51, 341-367 (1979) [CrossRef]
4. J. P. Black and K. C. Hickman, "Bulk scatter measurements in fused silica at two wavelengths; A comparison with Rayleigh scatter theory," in Optical Scattering: Applications, Measurement, and Theory II, J. C. Stover, ed., Proc. SPIE 1195, 273-284
5. S. Sakaguchi, S. Todoroki, T. Murata, "Rayleigh scattering in silica glasses with heat treatment," J. Non-Cryst. Solids 220, 178-186 (1997) [CrossRef]
6. S. Logunov, S. Kuchinsky, "Scattering losses in fused silica and CaF2 for DUV applications," in Optical Microlithography XVI, A. Yen, ed., Proc. SPIE 5040, 1396-1407 (2003) [CrossRef]
7. ISO 13696:2002, "Optics and optical instruments - Test methods for radiation scattered by optical components," International Organization for Standardization (2002)
8. A. Duparré, "Scattering from Surfaces and thin Films," in Encyclopedia of Modern Optics, R. D. Guenther et al., eds. (Elsevier, Oxford, 2004)
9. J. C. Stover, "Optical Scattering - Measurement and Analysis," 2nd Edition (SPIE-Press, Bellingham, Washington, 1995)
10. S. Schröder, S. Gliech, A. Duparré, "Sensitive and flexible light scatter techniques from the VUV to IR regions," in Optical Fabrication, Testing, and Metrology II, A. Duparré, R. Geyl, L. Wang, eds., Proc. SPIE 5965, 424-432 (2005)
11. S. Schröder, M. Kamprath, A. Duparré, "Scatter analysis of optical components from 193 nm to 13.5 nm," in Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II, A. Duparré, B. Singh, Z.-H. Gu, eds., Proc. SPIE 5878, 232-240 (2005)
12. S. Schröder, S. Gliech, A. Duparré, "Measurement system to determine the total and angle resolved light scattering of optical components in the deep-ultraviolet and vacuum-ultraviolet spectral regions," Appl. Opt. 44, 6093-6107 (2005) [CrossRef] [PubMed]
13. R. Brückner, "Silicon Dioxide", in "Encyclopedia of Applied Physics" Vol. 18, 1997
14. J.C. MikkelsenJr., F.L. Galeener, W.J. Mosby, "Raman Characterization of hydroxyl in fused silica and thermal grown SiO2," J. Electron. Mater.  10 (4), 1981 [CrossRef]
15. F.L. Galeener, "Raman and ESR studies of the thermal history of amorphous SiO2," J. Non-Cryst. Solids 71,373-386 (1985) [CrossRef]
16. Layertec GmbH, Germany
17. A. Duparré, J. Ferre-Borrull, S. Gliech, G. Notni, J. Steinert, J. M. Bennett, "Surface characterization techniques for determining the root-mean-square roughness and power spectral densities of optical components," Appl. Opt. 41, 154-171 (2002) [CrossRef] [PubMed]
18. K. Saito, A. J. Ikushima, T. Ito, A. Itoh, "A new method of developing ultralow-loss glasses," J. Appl. Phys. 81, 7129-7134 (1997) [CrossRef]
19. C. Levelut, A. Faivre, R. Le Parc, B. Champagnon, J.-L. Hazemann, J.-P. Simon, "In situ measurements of density fluctuations and compressibility in silica glasses as a function of temperature and thermal history," Phys. Rev. B 72, 224201-1-11 (2005) [CrossRef]

Appl. Opt.

• S. Schröder, S. Gliech, A. Duparré, "Measurement system to determine the total and angle resolved light scattering of optical components in the deep-ultraviolet and vacuum-ultraviolet spectral regions," Appl. Opt. 44, 6093-6107 (2005) [CrossRef] [PubMed]
• A. Duparré, J. Ferre-Borrull, S. Gliech, G. Notni, J. Steinert, J. M. Bennett, "Surface characterization techniques for determining the root-mean-square roughness and power spectral densities of optical components," Appl. Opt. 41, 154-171 (2002) [CrossRef] [PubMed]

Appl. Phys. Lett.

• D.A. Pinnow, T.C. Rich, F.W. Ostermayer, Jr., and M. DiDomenico, Jr., "Fundamental optical attenuation limits in the liquid and glassy state with application to fiber optical waveguide materials," Appl. Phys. Lett. 22, 527-529 (1973) [CrossRef]

J. Am. Ceram. Soc.

• J. Schroeder, R. Mohr, P. B. Macedo, C. J. Montrose, "Rayleigh and Brillouin Scattering in K2O-SiO2 Glasses," J. Am. Ceram. Soc. 56, 510-514 (1973) [CrossRef]

J. Appl. Phys.

• K. Saito, A. J. Ikushima, T. Ito, A. Itoh, "A new method of developing ultralow-loss glasses," J. Appl. Phys. 81, 7129-7134 (1997) [CrossRef]

J. Electron. Mater

• J.C. MikkelsenJr., F.L. Galeener, W.J. Mosby, "Raman Characterization of hydroxyl in fused silica and thermal grown SiO2," J. Electron. Mater.  10 (4), 1981 [CrossRef]

J. Non-Cryst. Solids

• F.L. Galeener, "Raman and ESR studies of the thermal history of amorphous SiO2," J. Non-Cryst. Solids 71,373-386 (1985) [CrossRef]
• S. Sakaguchi, S. Todoroki, T. Murata, "Rayleigh scattering in silica glasses with heat treatment," J. Non-Cryst. Solids 220, 178-186 (1997) [CrossRef]

Rev. Mod. Phys.

• R. Olshansky, "Propagation in glass optical waveguides," Rev. Mod. Phys. 51, 341-367 (1979) [CrossRef]

Other

• J. P. Black and K. C. Hickman, "Bulk scatter measurements in fused silica at two wavelengths; A comparison with Rayleigh scatter theory," in Optical Scattering: Applications, Measurement, and Theory II, J. C. Stover, ed., Proc. SPIE 1195, 273-284
• R. Brückner, "Silicon Dioxide", in "Encyclopedia of Applied Physics" Vol. 18, 1997
• S. Logunov, S. Kuchinsky, "Scattering losses in fused silica and CaF2 for DUV applications," in Optical Microlithography XVI, A. Yen, ed., Proc. SPIE 5040, 1396-1407 (2003) [CrossRef]
• ISO 13696:2002, "Optics and optical instruments - Test methods for radiation scattered by optical components," International Organization for Standardization (2002)
• A. Duparré, "Scattering from Surfaces and thin Films," in Encyclopedia of Modern Optics, R. D. Guenther et al., eds. (Elsevier, Oxford, 2004)
• J. C. Stover, "Optical Scattering - Measurement and Analysis," 2nd Edition (SPIE-Press, Bellingham, Washington, 1995)
• S. Schröder, S. Gliech, A. Duparré, "Sensitive and flexible light scatter techniques from the VUV to IR regions," in Optical Fabrication, Testing, and Metrology II, A. Duparré, R. Geyl, L. Wang, eds., Proc. SPIE 5965, 424-432 (2005)
• S. Schröder, M. Kamprath, A. Duparré, "Scatter analysis of optical components from 193 nm to 13.5 nm," in Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II, A. Duparré, B. Singh, Z.-H. Gu, eds., Proc. SPIE 5878, 232-240 (2005)
• Layertec GmbH, Germany
• C. Levelut, A. Faivre, R. Le Parc, B. Champagnon, J.-L. Hazemann, J.-P. Simon, "In situ measurements of density fluctuations and compressibility in silica glasses as a function of temperature and thermal history," Phys. Rev. B 72, 224201-1-11 (2005) [CrossRef]

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