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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 22 — Oct. 30, 2006
  • pp: 10753–10758

Femtosecond fabricated photomasks for fabrication of microfluidic devices

Daniel Day and Min Gu  »View Author Affiliations

Optics Express, Vol. 14, Issue 22, pp. 10753-10758 (2006)

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This paper describes the direct write laser fabrication of a photolithography mask for prototyping of microfluidic devices in polydimethylsiloxane. An amplified femtosecond pulse laser is used to selectively remove the aluminium metal layer from the poly(methyl methacrylate) photomask substrate. The use of a femtosecond pulse laser to selectively etch a metal layer has several advantages over other conventional methods for binary photomask fabrication, namely rapid prototyping of microfluidic devices using soft lightography. Control of the energy density and defocus position of the focusing objective lens results in the etching of features with widths ranging from 2 μm to 35 μm when using an objective lens with a numerical aperture of 0.25.

© 2006 Optical Society of America

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(320.2250) Ultrafast optics : Femtosecond phenomena
(350.3390) Other areas of optics : Laser materials processing

ToC Category:
Optical Design and Fabrication

Original Manuscript: September 19, 2006
Revised Manuscript: October 17, 2006
Manuscript Accepted: October 18, 2006
Published: October 30, 2006

Virtual Issues
Vol. 1, Iss. 11 Virtual Journal for Biomedical Optics

Daniel Day and Min Gu, "Femtosecond fabricated photomasks for fabrication of microfluidic devices," Opt. Express 14, 10753-10758 (2006)

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