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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 25 — Dec. 11, 2006
  • pp: 11952–11957

Diffraction-limited performance of flat-substrate reflective imaging gratings patterned by DUV photolithography

Christoph M. Greiner, D. Iazikov, and T. W. Mossberg  »View Author Affiliations

Optics Express, Vol. 14, Issue 25, pp. 11952-11957 (2006)

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We report on the first demonstration of flat substrate imaging gratings fabricated by deep ultraviolet (DUV) photoreduction lithography, which uniquely offers sub-100-nm resolution and spatial coherence over centimeter scales. Reflective focusing gratings, designed according to holographic principle, were fabricated on 300-mm silicon wafers by immersion DUV lithography. Spatial coherence of the fabrication process is evident in measured diffraction-limited imaging function. Flat-substrate gratings, with lines of arbitrary spacing and curvature, offer both dispersion and general spatial wavefront transformation combining the function of multiple optical elements. Fabrication at the sub-100-nm resolution level allows high-line-count, low-order efficient gratings even into the deep ultraviolet region. Nanoreplication of gratings at the wafer level provides a pathway to devices of ultimate low cost.

© 2006 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.1970) Diffraction and gratings : Diffractive optics
(050.2770) Diffraction and gratings : Gratings
(090.1760) Holography : Computer holography
(090.2890) Holography : Holographic optical elements
(110.3960) Imaging systems : Microlithography

ToC Category:
Diffraction and Gratings

Original Manuscript: October 25, 2006
Revised Manuscript: November 20, 2006
Manuscript Accepted: November 21, 2006
Published: December 11, 2006

Christoph M. Greiner, D. Iazikov, and T. W. Mossberg, "Diffraction-limited performance of flat-substrate reflective imaging gratings patterned by DUV photolithography," Opt. Express 14, 11952-11957 (2006)

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