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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 14, Iss. 6 — Mar. 20, 2006
  • pp: 2300–2308

Fabricating three dimensional nanostructures using two photon lithography in a single exposure step

Seokwoo Jeon, Viktor Malyarchuk, John A. Rogers, and Gary P. Wiederrecht  »View Author Affiliations


Optics Express, Vol. 14, Issue 6, pp. 2300-2308 (2006)
http://dx.doi.org/10.1364/OE.14.002300


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Abstract

Conformable phase masks, transparent photopolymers and two photon effects provide the basis for a simple, parallel lithographic technique that can form complex, but well defined three dimensional (3D) nanostructures in a single exposure step. This paper describes the method, presents examples of its ability to form 3D nanostructures (including free standing particles with controlled shapes) and comprehensive modeling of the associated optics. Single step, large area 3D pattern definition, sub-wavelength resolution and experimental simplicity represent features that make this method potentially useful for applications in photonics, biotechnology and other areas.

© 2006 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(220.4000) Optical design and fabrication : Microstructure fabrication
(320.7110) Ultrafast optics : Ultrafast nonlinear optics

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: January 17, 2006
Manuscript Accepted: March 6, 2006
Published: March 20, 2006

Virtual Issues
Vol. 1, Iss. 4 Virtual Journal for Biomedical Optics

Citation
Seokwoo Jeon, Viktor Malyarchuk, John A. Rogers, and Gary P. Wiederrecht, "Fabricating three-dimensional nanostructures using two photon lithography in a single exposure step," Opt. Express 14, 2300-2308 (2006)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-14-6-2300


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