Optical monitoring of nonquarterwave layers of dielectric multilayer filters using optical admittance
Optics Express, Vol. 14, Issue 6, pp. 2473-2480 (2006)
http://dx.doi.org/10.1364/OE.14.002473
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Abstract
An optical monitoring method is described to compensate for the thickness error of nonquarterwave layers of dielectric multilayer filters, using optical admittance during deposition. Stability is confirmed by computer simulation of random thickness error generation in layers. In addition, a band split filter consisting of 61 nonquarterwave and nonperiodic layers is deposited using the proposed method, resulting in high spectral performance, as the application requires.
© 2006 Optical Society of America
OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties
ToC Category:
Thin Films
History
Original Manuscript: November 30, 2005
Revised Manuscript: March 8, 2006
Manuscript Accepted: March 13, 2006
Published: March 20, 2006
Citation
Byung Chun, Chang Kwon Hwangbo, and Jong Sup Kim, "Optical monitoring of nonquarterwave layers of dielectric multilayer filters using optical admittance," Opt. Express 14, 2473-2480 (2006)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-14-6-2473
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References
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