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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 10 — May. 14, 2007
  • pp: 6367–6373

Micro knife-edge optical measurement device in a silicon-on-insulator substrate

Yi Chiu and Jiun-Hung Pan  »View Author Affiliations


Optics Express, Vol. 15, Issue 10, pp. 6367-6373 (2007)
http://dx.doi.org/10.1364/OE.15.006367


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Abstract

The knife-edge method is a commonly used technique to characterize the optical profiles of laser beams or focused spots. In this paper, we present a micro knife-edge scanner fabricated in a silicon-on-insulator substrate using the micro-electromechanical-system technology. A photo detector can be fabricated in the device to allow further integration with on-chip signal conditioning circuitry. A novel backside deep reactive ion etching process is proposed to solve the residual stress effect due to the buried oxide layer. Focused optical spot profile measurement is demonstrated.

© 2007 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(230.4000) Optical devices : Microstructure fabrication

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: March 26, 2007
Revised Manuscript: May 7, 2007
Manuscript Accepted: May 7, 2007
Published: May 8, 2007

Citation
Yi Chiu and Jiun-Hung Pan, "Micro knife-edge optical measurement device in a silicon-on-insulator substrate," Opt. Express 15, 6367-6373 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-10-6367


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