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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 11 — May. 28, 2007
  • pp: 6774–6783

Fabrication of a close-packed hemispherical submicron lens array and its application in photolithography

Wei-Lun Chang and Pei-Kuen Wei  »View Author Affiliations


Optics Express, Vol. 15, Issue 11, pp. 6774-6783 (2007)
http://dx.doi.org/10.1364/OE.15.006774


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Abstract

The fabrication and characteristics of close-packed lens arrays with a feature size close to the optical diffraction limit are presented in this study. By controlling the size of the submicron nickel rods and the time for reactive dry etching, the hemispherical lens array with a submicron period is made directly on a borosilicate glass. Finite-difference time-domain calculations and optical near-field measurements show that such a lens array can generate a subwavelength optical spot array near the glass surface. Moreover, the spot array periodically appears in the propagation direction. Using this novel optical property, we propose a photolithographic method for the mass-production of multilayer hexagonal structures with a period of 500nm.

© 2007 Optical Society of America

OCIS Codes
(180.5810) Microscopy : Scanning microscopy
(220.2560) Optical design and fabrication : Propagating methods
(220.3620) Optical design and fabrication : Lens system design
(220.3740) Optical design and fabrication : Lithography

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: November 16, 2006
Revised Manuscript: December 29, 2006
Manuscript Accepted: January 16, 2007
Published: May 17, 2007

Citation
Wei-Lun Chang and Pei-Kuen Wei, "Fabrication of a close-packed hemispherical submicron lens array and its application in photolithography," Opt. Express 15, 6774-6783 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-11-6774


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