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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 17 — Aug. 20, 2007
  • pp: 10666–10671

Reflective second harmonic generation near resonance in the epitaxial Al-doped ZnO thin film

S.W. Liu, J.L. Weerasinghe, J. Liu, J. Weaver, C.L. Chen, W. Donner, and Min Xiao  »View Author Affiliations

Optics Express, Vol. 15, Issue 17, pp. 10666-10671 (2007)

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The second harmonic (SH) generation from the highly epitaxial Al-doped ZnO film on sapphire was measured, using the femtosecond Ti:Sapphire laser at the near-resonant SH wavelength, in reflection geometry to avoid the sapphire’s contribution in the conventional Maker fringes technique. By investigating SH intensities as a function of the azimuthal angle along the film’s normal, we found that the sapphire substrate had a negligible contribution to the reflective SH signal and the film had a pure and well-aligned c-domain. We also developed a new method to calculate the component’s ratios of the nonlinear susceptibility tensor by analyzing the polarization diagrams of SH intensities under the incidence with two different angles. The ratios indicate that Kleinman’s symmetry is broken due to the absorption at SH wavelength and the dominant component of the nonlinear susceptibility tensor is d33. Calibration using the Z-cut quartz shows a possible overestimate of the nonlinear response by Maker fringes technique.

© 2007 Optical Society of America

OCIS Codes
(190.4400) Nonlinear optics : Nonlinear optics, materials
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Nonlinear Optics

Original Manuscript: April 12, 2007
Revised Manuscript: June 1, 2007
Manuscript Accepted: June 7, 2007
Published: August 8, 2007

S. W. Liu, J. L. Weerasinghe, J. Liu, J. Weaver, C. L. Chen, W. Donner, and Min Xiao, "Reflective second harmonic generation near resonance in the epitaxial Al-doped ZnO thin film," Opt. Express 15, 10666-10671 (2007)

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