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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 17 — Aug. 20, 2007
  • pp: 10744–10752

Refractive index and extinction coefficient dependence of thin Al and Ir films on deposition technique and thickness

Anni Lehmuskero, Markku Kuittinen, and Pasi Vahimaa  »View Author Affiliations


Optics Express, Vol. 15, Issue 17, pp. 10744-10752 (2007)
http://dx.doi.org/10.1364/OE.15.010744


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Abstract

We show that the optical properties of thin metallic films depend on the thickness of the film as well as on the deposition technique. Several thicknesses of electron-beam-gun-evaporated aluminium films were measured and the refractive index and the extinction coefficient defined using ellipsometry. In addition, the refractive indexes and the extinction coefficients of atomic-layer-deposited iridium were compared with those of evaporated iridium samples.

© 2007 Optical Society of America

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Thin Films

History
Original Manuscript: March 21, 2007
Revised Manuscript: June 18, 2007
Manuscript Accepted: June 28, 2007
Published: August 10, 2007

Citation
Anni Lehmuskero, Markku Kuittinen, and Pasi Vahimaa, "Refractive index and extinction coefficient dependence of thin Al and Ir films on deposition technique and thickness," Opt. Express 15, 10744-10752 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-17-10744


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References

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