OSA's Digital Library

Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 18 — Sep. 3, 2007
  • pp: 11542–11552

Subwavelength optical imaging of evanescent fields using reflections from plasmonic slabs

Matthew D. Arnold and Richard J. Blaikie  »View Author Affiliations

Optics Express, Vol. 15, Issue 18, pp. 11542-11552 (2007)

View Full Text Article

Enhanced HTML    Acrobat PDF (286 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



Reflection can significantly improve the quality of subwavelength near-field images, which is explained by appropriate interference between forward and reflected waves. Plasmonic slabs may form approximate super-mirrors. This paper develops general theory in both spectral and spatial representations that allows the reflector position and permittivity to be determined for optimum image uniformity. This elucidates previous observations and predicts behaviour for some other interesting regimes, including interferometric lithography.

© 2007 Optical Society of America

OCIS Codes
(100.6640) Image processing : Superresolution
(110.5220) Imaging systems : Photolithography
(240.6680) Optics at surfaces : Surface plasmons
(260.3910) Physical optics : Metal optics

ToC Category:
Optics at Surfaces

Original Manuscript: June 14, 2007
Revised Manuscript: August 20, 2007
Manuscript Accepted: August 21, 2007
Published: August 27, 2007

Matthew D. Arnold and Richard J. Blaikie, "Subwavelength optical imaging of evanescent fields using reflections from plasmonic slabs," Opt. Express 15, 11542-11552 (2007)

Sort:  Year  |  Journal  |  Reset  


  1. J. B. Pendry, "Negative refraction makes a perfect lens," Phys. Rev. Lett. 85, 3966-3969 (2000). [CrossRef] [PubMed]
  2. J. S. Wei and F. X. Gan, "Dynamic readout of subdiffraction-limited pit arrays with a silver superlens," Appl. Phys. Lett. 87, 211101 (2005). [CrossRef]
  3. T. Taubner, D. Korobkin, Y. Urzhumov, G. Shvets, R. Hillenbrand, "Near-field microscopy through a SiC superlens," Science 313, 1595-1595 (2006). [CrossRef] [PubMed]
  4. D. O. S. Melville and R. J. Blaikie, "Super-resolution imaging through a planar silver layer," Opt. Express 13, 2127-2134 (2005) [CrossRef] [PubMed]
  5. N. Fang, H. Lee, C. Sun, X. Zhang, "Sub-diffraction-limited optical imaging with a silver superlens," Science 308, 534-537 (2005). [CrossRef] [PubMed]
  6. R. J. Blaikie, M. M. Alkaisi, S. J. McNab, D. O. S. Melville, "Nanoscale optical patterning using evanescent fields and surface plasmons," Int. J. Nanoscience 3, 405-417 (2004) [CrossRef]
  7. D. B. Shao and S. C. Chen, "Surface-plasmon-assisted nanoscale photolithography by polarized light," Appl. Phys. Lett. 86, 253107 (2005) [CrossRef]
  8. D. B. Shao and S. C. Chen, "Numerical simulation of surface-plasmon-assisted nanolithography," Opt. Express 13, 6964-6973 (2005). [CrossRef] [PubMed]
  9. M. D. Arnold and R. J. Blaikie, "Using surface-plasmon effects to improve process latitude in near-field optical lithography," in Proceedings of the International Conference on Nanoscience and Nanotechnology, Brisbane, Australia, IEEE Press 06EX1411C, 548-551 (2006).
  10. M. Schrader, M. Kozubek, S. W. Hell, T. Wilson, "Optical transfer functions of 4Pi confocal microscopes: theory and experiment," Opt. Lett. 22, 436-438 (1997). [CrossRef] [PubMed]
  11. B. W. Smith, Y. Fan, J. Zhou, N. Lafferty, A. Estroff, "Evanescent wave imaging in optical lithography," Proc. SPIE 6154 (2006)

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited