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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 18 — Sep. 3, 2007
  • pp: 11542–11552

Subwavelength optical imaging of evanescent fields using reflections from plasmonic slabs

Matthew D. Arnold and Richard J. Blaikie  »View Author Affiliations


Optics Express, Vol. 15, Issue 18, pp. 11542-11552 (2007)
http://dx.doi.org/10.1364/OE.15.011542


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Abstract

Reflection can significantly improve the quality of subwavelength near-field images, which is explained by appropriate interference between forward and reflected waves. Plasmonic slabs may form approximate super-mirrors. This paper develops general theory in both spectral and spatial representations that allows the reflector position and permittivity to be determined for optimum image uniformity. This elucidates previous observations and predicts behaviour for some other interesting regimes, including interferometric lithography.

© 2007 Optical Society of America

OCIS Codes
(100.6640) Image processing : Superresolution
(110.5220) Imaging systems : Photolithography
(240.6680) Optics at surfaces : Surface plasmons
(260.3910) Physical optics : Metal optics

ToC Category:
Optics at Surfaces

History
Original Manuscript: June 14, 2007
Revised Manuscript: August 20, 2007
Manuscript Accepted: August 21, 2007
Published: August 27, 2007

Citation
Matthew D. Arnold and Richard J. Blaikie, "Subwavelength optical imaging of evanescent fields using reflections from plasmonic slabs," Opt. Express 15, 11542-11552 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-18-11542


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References

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