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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 19 — Sep. 17, 2007
  • pp: 12539–12547

Etching of photosensitive chalcogenide glasses:experiments and simulations

Raphi Dror, B. Sfez, Sh. Y. Goldin, and A. Cashingad  »View Author Affiliations

Optics Express, Vol. 15, Issue 19, pp. 12539-12547 (2007)

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We have developed a three-dimensional simulation algorithm based on fast marching method that mimics the etching behavior of chalcogenide photoresists, especially for maskless interference lithography. This lithography exposure is characterized by continuous variation of the exposure intensity inside the photoresist, without step like variation. Furthermore, the chalcogenide photoresist has a “gray-scale” behavior, without definite threshold. The resulting etching process is very sensitive to exposure dose and etching time. The optimal relations between these parameters are determined both theoretically and experimentally. A very good agreement between calculation and experimental results is shown, opening the door to complex nanostructures engineering.

© 2007 Optical Society of America

OCIS Codes
(050.7330) Diffraction and gratings : Volume gratings
(160.2900) Materials : Optical storage materials

ToC Category:

Original Manuscript: July 17, 2007
Revised Manuscript: August 9, 2007
Manuscript Accepted: August 13, 2007
Published: September 14, 2007

Raphi Dror, B. Sfez, Sh. Y. Goldin, and A. Cashingad, "Etching of photosensitive chalcogenide glasses:experiments and simulations," Opt. Express 15, 12539-12547 (2007)

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