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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 2 — Jan. 22, 2007
  • pp: 501–507

Large-area magnetic metamaterials via compact interference lithography

Nils Feth, Christian Enkrich, Martin Wegener, and Stefan Linden  »View Author Affiliations


Optics Express, Vol. 15, Issue 2, pp. 501-507 (2007)
http://dx.doi.org/10.1364/OE.15.000501


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Abstract

Magnetic metamaterials with magnetic-dipole resonances around 1.2-μm wavelength are fabricated using an extremely compact and robust version of two- or three-beam interference lithography for 1D and 2D structures, respectively. Our approach employs a single laser beam at 532-nm wavelength impinging onto a suitably shaped dielectric object (roof-top prism or pyramid) – bringing the complexity of fabricating magnetic metamaterials down to that of evaporating usual dielectric/metallic coatings. The measured optical spectra agree well with theory; the retrieval reveals a negative magnetic permeability. Importantly, the large-scale sample homogeneity is explicitly demonstrated by optical experiments.

© 2007 Optical Society of America

OCIS Codes
(160.4760) Materials : Optical properties
(220.3740) Optical design and fabrication : Lithography
(260.5740) Physical optics : Resonance

ToC Category:
Metamaterials

History
Original Manuscript: August 29, 2006
Revised Manuscript: November 17, 2006
Manuscript Accepted: November 29, 2006
Published: January 22, 2007

Citation
Nils Feth, Christian Enkrich, Martin Wegener, and Stefan Linden, "Large-area magnetic metamaterials via compact interference lithography," Opt. Express 15, 501-507 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-2-501


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