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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 20 — Oct. 1, 2007
  • pp: 13108–13113

Antireflection of transparent polymers by advanced plasma etching procedures

U. Schulz, P. Munzert, R. Leitel, I. Wendling, N. Kaiser, and A. Tünnermann  »View Author Affiliations


Optics Express, Vol. 15, Issue 20, pp. 13108-13113 (2007)
http://dx.doi.org/10.1364/OE.15.013108


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Abstract

Self-organized nanostructures that provide antireflection properties grow on PMMA caused by plasma ion etching. A new procedure uses a thin initial layer prior to the etching step. Different types of antireflective structures can now be produced in a shorter time and with fewer limitations on the type of polymer that can be used. The durability of the structured surfaces can be improved by the deposition of additional thin films.

© 2007 Optical Society of America

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(310.1210) Thin films : Antireflection coatings
(310.1860) Thin films : Deposition and fabrication

ToC Category:
Thin Films

History
Original Manuscript: July 6, 2007
Revised Manuscript: September 24, 2007
Manuscript Accepted: September 24, 2007
Published: September 26, 2007

Citation
U. Schulz, P. Munzert, R. Leitel, I. Wendling, N. Kaiser, and A. Tünnermann, "Antireflection of transparent polymers by advanced plasma etching procedures," Opt. Express 15, 13108-13113 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-20-13108


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References

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