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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 21 — Oct. 17, 2007
  • pp: 13997–14012

EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates

Sven Schröder, Torsten Feigl, Angela Duparré, and Andreas Tünnermann  »View Author Affiliations

Optics Express, Vol. 15, Issue 21, pp. 13997-14012 (2007)

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Highly reflective Molybdenum/Silicon multilayer mirrors for 13.5 nm are characterized at-wavelength using a new laboratory size measurement system for EUV reflectance and scattering. Roughness analysis before and after coating by Atomic Force Microscopy indicates roughness enhancement as well as smoothing effects during thin film growth. The impact of the substrate finish and the deposition process onto the scattering distribution and scatter losses with regard to the specular reflectance is analyzed.

© 2007 Optical Society of America

OCIS Codes
(120.5700) Instrumentation, measurement, and metrology : Reflection
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(120.6660) Instrumentation, measurement, and metrology : Surface measurements, roughness
(240.0310) Optics at surfaces : Thin films
(260.7200) Physical optics : Ultraviolet, extreme

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: July 31, 2007
Revised Manuscript: October 5, 2007
Manuscript Accepted: October 8, 2007
Published: October 11, 2007

Sven Schröder, Torsten Feigl, Angela Duparré, and Andreas Tünnermann, "EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates," Opt. Express 15, 13997-14012 (2007)

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