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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 22 — Oct. 29, 2007
  • pp: 14750–14764

Sub-critical regime of femtosecond inscription

Sergei K. Turitsyn, Vladimir K. Mezentsev, Mykhaylo Dubov, Alexander M. Rubenchik, Michail P. Fedoruk, and Evgeny V. Podivilov  »View Author Affiliations


Optics Express, Vol. 15, Issue 22, pp. 14750-14764 (2007)
http://dx.doi.org/10.1364/OE.15.014750


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Abstract

We apply well known nonlinear diffraction theory governing focusing of a powerful light beam of arbitrary shape in medium with Kerr nonlinearity to the analysis of femtosecond (fs) laser processing of dielectric in sub-critical (input power less than the critical power of self-focusing) regime. Simple analytical expressions are derived for the input beam power and spatial focusing parameter (numerical aperture) that are required for achieving an inscription threshold. Application of non-Gaussian laser beams for better controlled fs inscription at higher powers is also discussed.

© 2007 Optical Society of America

OCIS Codes
(190.7110) Nonlinear optics : Ultrafast nonlinear optics
(220.4000) Optical design and fabrication : Microstructure fabrication
(320.2250) Ultrafast optics : Femtosecond phenomena

ToC Category:
Ultrafast Optics

History
Original Manuscript: July 9, 2007
Revised Manuscript: September 20, 2007
Manuscript Accepted: October 8, 2007
Published: October 24, 2007

Citation
Sergei K. Turitsyn, Vladimir K. Mezentsev, Mykhaylo Dubov, Alexander M. Rubenchik, Michail P. Fedoruk, and Evgeny V. Podivilov, "Sub-critical regime of femtosecond inscription," Opt. Express 15, 14750-14764 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-22-14750


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