Dynamic spectroscopic ellipsometry determination of nanostructural changes in plasmonic silver films
Optics Express, Vol. 15, Issue 24, pp. 15987-15998 (2007)
http://dx.doi.org/10.1364/OE.15.015987
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Abstract
Dynamic in situ spectroscopic ellipsometry is used to probe post-deposition nano-structural changes in silver films at room temperature in the pre- and post-coalescence stages of Volmer-Weber growth. In the island growth phase the Maxwell-Garnett theory is used to determine structural changes in the island film. Changes in the plasmon resonance frequency indicate an increased distance between islands which explain pre-coalescence resistivity changes. Post-coalescence changes in the resistivity are determined to be due to grain growth. A reduction in film thickness of 0.2–0.3 nm is also observed. The results are used to evaluate recent competing theories based on in situ stress measurements.
© 2007 Optical Society of America
OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(160.4236) Materials : Nanomaterials
(240.2130) Optics at surfaces : Ellipsometry and polarimetry
ToC Category:
Optics at Surfaces
History
Original Manuscript: September 26, 2007
Revised Manuscript: November 7, 2007
Manuscript Accepted: November 7, 2007
Published: November 19, 2007
Citation
T. W. H. Oates, L. Ryves, and M. M. M. Bilek, "Dynamic spectroscopic ellipsometry determination of nanostructural changes in plasmonic silver films," Opt. Express 15, 15987-15998 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-24-15987
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