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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 24 — Nov. 26, 2007
  • pp: 15987–15998

Dynamic spectroscopic ellipsometry determination of nanostructural changes in plasmonic silver films

T. W. H. Oates, L. Ryves, and M. M. M. Bilek  »View Author Affiliations


Optics Express, Vol. 15, Issue 24, pp. 15987-15998 (2007)
http://dx.doi.org/10.1364/OE.15.015987


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Abstract

Dynamic in situ spectroscopic ellipsometry is used to probe post-deposition nano-structural changes in silver films at room temperature in the pre- and post-coalescence stages of Volmer-Weber growth. In the island growth phase the Maxwell-Garnett theory is used to determine structural changes in the island film. Changes in the plasmon resonance frequency indicate an increased distance between islands which explain pre-coalescence resistivity changes. Post-coalescence changes in the resistivity are determined to be due to grain growth. A reduction in film thickness of 0.2–0.3 nm is also observed. The results are used to evaluate recent competing theories based on in situ stress measurements.

© 2007 Optical Society of America

OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(160.4236) Materials : Nanomaterials
(240.2130) Optics at surfaces : Ellipsometry and polarimetry

ToC Category:
Optics at Surfaces

History
Original Manuscript: September 26, 2007
Revised Manuscript: November 7, 2007
Manuscript Accepted: November 7, 2007
Published: November 19, 2007

Citation
T. W. H. Oates, L. Ryves, and M. M. M. Bilek, "Dynamic spectroscopic ellipsometry determination of nanostructural changes in plasmonic silver films," Opt. Express 15, 15987-15998 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-24-15987


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