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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 25 — Dec. 10, 2007
  • pp: 16348–16356

13.5 nm EUV generation from tin-doped droplets using a fiber laser

Simi A. George, Kai-Chung Hou, Kazutoshi Takenoshita, Almantas Galvanauskas, and Martin C. Richardson  »View Author Affiliations

Optics Express, Vol. 15, Issue 25, pp. 16348-16356 (2007)

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A comprehensive study of the spectral and Mo-Si mirror inband EUV emission from tin-doped droplet laser plasma targets irradiated with a single 1064 nm beam from an Yb:doped fiber laser is reported. With pre-pulse enhancement, in-band conversion efficiency of approximately 2.1% is measured for laser irradiance intensities near 8×1010 W/cm2. This is the first study to be reported that uses a high-power, high repetition rate fiber laser with the high repetition rate droplet targets where EUV generation from plasmas is measured.

© 2007 Optical Society of America

OCIS Codes
(300.0300) Spectroscopy : Spectroscopy
(340.0340) X-ray optics : X-ray optics

ToC Category:

Original Manuscript: September 28, 2007
Revised Manuscript: November 15, 2007
Manuscript Accepted: November 17, 2007
Published: November 26, 2007

Simi A. George, Kai-Chung Hou, Kazutoshi Takenoshita, Almantas Galvanauskas, and Martin C. Richardson, "13.5 nm EUV generation from tin-doped droplets using a fiber laser," Opt. Express 15, 16348-16356 (2007)

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  1. C. W. Gwyn, R. Stulen, D. Sweeney, and D. Attwood, "Extreme ultraviolet lithography," J. Vac. Sci. Technol. B 16, 3142-3149 (1998). [CrossRef]
  2. S. Bajt, J. B. Alameda, T. W. Barbee, Jr., W. M. Clift, J.A. Folta, B.B. Kaufmann, and E. A. Spiller, "Improved reflectance and stability of Mo/Si multilayers," Proc. SPIE (4506), 65-75 (2001). [CrossRef]
  3. V. Bakshi, EUV Sources for Lithography(SPIE Press, Washington, 2005)
  4. A. Miyake and H. Kanazawa and V. Banine and K. Suzuki, "Joint Requirements," Presentation at EUVWorkshop, October 19, 2006. Proceedings available at www.sematech.org
  5. D. T. Attwood, Soft x-rays and extreme ultraviolet radiation: principles and applications (Cambridge University Press, Berkeley, 2000).
  6. S. Ellwi, "High Power lasers for EUV sources." Presentation at EUV Source Workshop, May 6, 2007, Baltimore MA.
  7. D. Brandt, "LPP EUV Source Development for HVM," Presented at EUVL symposium, Barcelona, Spain, Oct. 17 2006.
  8. D. Colombant and G. F. Tonon, "X-ray emission in laser-produced plasmas," J. Appl. Phys. 44, 3524-3537 (1973). [CrossRef]
  9. W. Svendsen and G. O’Sullivan, "Statistics and characteristics of xuv transition arrays from laser-produced plasmas of the elements tin through iodine," Phys. Rev. A 50, 3710-3718 (1994). [CrossRef] [PubMed]
  10. M. Al-Rabban, "Term structure of 4d-electron configurations and calculated spectrum in Sn-isonuclear sequence," J. Quant. Spectrosc. Radiat. Transfer.,  97, 278-316 (2006). [CrossRef]
  11. R.D. Bleach and D. J. Nagel, J.Appl. Phys. 49, 3832-3841 (1978). [CrossRef]
  12. R.C. Spitzer, T.J. Orzechowski, D.W. Phillion, R.L. Kauffman, and C. Cerjan, J. Appl. Phys. 79, 2251-253 (1996). [CrossRef]
  13. C-S Koay, "Radiation studies of the tin-doped microscopic drolet laser plasma light source specific to EUV lithography," Ph. D. thesis University of Central Florida, 2006.
  14. S. A. George, C-S. Koay, K. Takenoshita, R. Bernath, M. Al-Rabban, C. Keyser, V. Bakshi, H. Scott, and M. Richardson, "EUV spectroscopy of mass-limited Sn-doped laser micro plasmas," Proceedings of SPIE 5751, 779-788 (2005). [CrossRef]
  15. C-S Koay, S. George, K. Takenoshita, R. Bernath, E. Fujiwara, M. Richardson, and V. Bakshi, "High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL," Proc. SPIE 5751, 279-292 (2005). [CrossRef]
  16. M. Richardson, US Patent 6865, 255, Mar. 2005.
  17. F. Jin and M. Richardson, "New laser plasma source for extreme-ultraviolet lithography," Appl. Opt. 34, 5750-5760 (1995). [CrossRef] [PubMed]
  18. M. C. Richardson, C-S. Koay, K. Takenoshita, C. Keyser, "High conversion efficiency mass-limited Sn-based laser plasma source for EUV lithography," J. Vac. Sci. Technol. B,  22, 785-790 (2004). [CrossRef]
  19. K. Takenoshita, C-S Koay, S. Teerawattanasook, M. Richardson, and V. Bakshi, "Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources," Proc. SPIE 5751, 563-571 (2005). [CrossRef]
  20. http://www.laserfocusworld.com/articles/article_display.html?id=234077
  21. A. Mordovanakis, K-C. Hou, Y-C. Chang, M-Y. Cheng, J. Nees, B. Hou, A. maksimchuk, G. Mourou, B. Lafontaine, and A. Galvanauskas, Opt. Lett. 31, 17, 2517-2519 (2006). [CrossRef] [PubMed]
  22. K-C. Hou et al, "Multi-MW Peak Power Scaling of Single-Transverse Mode Pulses using 80-m Core Yb-doped LMA Fibers", presented in Post Deadline Paper session at Advanced Solid-State Photonics (Optical Society of America, 2006).
  23. P. Dunne, G. O’Sullivan, and D. O’Reilly, "Prepulse-enhanced narrow bandwidth soft x-ray emission from a low debris, subnanosecond, laser plasma source," Appl. Phys. Lett. 76, 34-36 (2000). [CrossRef]
  24. S. Dusterer, H. Schwoerer, W. Ziegler, C. Ziener, and R. Sauerbrey, "Optimization of EUV radiation yield from laser-produced plasma," App. Phys. B,  73, 693-698 (2001). [CrossRef]
  25. T. Harada and T. Kita, "Mechanically ruled aberration-corrected concave gratings," Appl. Opt. 19, 3987-3993 (1980). [CrossRef] [PubMed]
  26. R. Stuik, F. Scholzeb, J. Tummler, F. Bijkerk, "Absolute calibration of a multilayer-based XUV diagnostic," Nucl. Instrum. and Methods. Phys. B 492, 305-316 (2002). [CrossRef]

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