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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 26 — Dec. 24, 2007
  • pp: 17855–17862

Control of ionization processes in high band gap materials via tailored femtosecond pulses

L. Englert, B. Rethfeld, L. Haag, M. Wollenhaupt, C. Sarpe-Tudoran, and T. Baumert  »View Author Affiliations

Optics Express, Vol. 15, Issue 26, pp. 17855-17862 (2007)

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Control of two basic ionization processes in dielectrics i.e. photo ionization and electron–electron impact ionization on intrinsic time and intensity scales is investigated experimentally and theoretically. Temporally asymmetric femtosecond pulses of identical fluence, spectrum and pulse duration result in different final free electron densities. We found that an asymmetric pulse and its time reversed counterpart address two ionization processes in a different fashion. This results in the observation of different thresholds for surface material modification in sapphire and fused silica. We conclude that control of ionization processes with tailored femtosecond pulses is suitable for robust manipulation of breakdown and thus control of the initial steps of laser processing of high band gap materials.

© 2007 Optical Society of America

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(140.3440) Lasers and laser optics : Laser-induced breakdown
(190.4180) Nonlinear optics : Multiphoton processes
(320.2250) Ultrafast optics : Femtosecond phenomena
(320.5540) Ultrafast optics : Pulse shaping
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Ultrafast Optics

Original Manuscript: October 26, 2007
Revised Manuscript: December 7, 2007
Manuscript Accepted: December 7, 2007
Published: December 14, 2007

L. Englert, B. Rethfeld, L. Haag, M. Wollenhaupt, Cristian Sarpe-Tudoran, and T. Baumert, "Control of ionization processes in high band gap materials via tailored femtosecond pulses," Opt. Express 15, 17855-17862 (2007)

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