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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 3 — Feb. 5, 2007
  • pp: 1261–1266

Imprinted silicon-based nanophotonics

Peter I. Borel, Brian Bilenberg, Lars H. Frandsen, Theodor Nielsen, Jacob Fage-Pedersen, Andrei V. Lavrinenko, Jakob S. Jensen, Ole Sigmund, and Anders Kristensen  »View Author Affiliations

Optics Express, Vol. 15, Issue 3, pp. 1261-1266 (2007)

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We demonstrate and optically characterize silicon-on-insulator based nanophotonic devices fabricated by nanoimprint lithography. In our demonstration, we have realized ordinary and topology-optimized photonic crystal waveguide structures. The topology-optimized structures require lateral pattern definition on a sub 30-nm scale in combination with a deep vertical silicon etch of the order of ~300 nm. The nanoimprint method offers a cost-efficient parallel fabrication process with state-of-the-art replication fidelity, comparable to direct electron beam writing.

© 2007 Optical Society of America

OCIS Codes
(000.3860) General : Mathematical methods in physics
(000.4430) General : Numerical approximation and analysis
(220.4000) Optical design and fabrication : Microstructure fabrication
(220.4830) Optical design and fabrication : Systems design
(230.3120) Optical devices : Integrated optics devices
(230.4000) Optical devices : Microstructure fabrication

ToC Category:
Photonic Crystals

Original Manuscript: November 6, 2006
Revised Manuscript: January 18, 2007
Manuscript Accepted: January 19, 2007
Published: February 5, 2007

Peter I. Borel, Brian Bilenberg, Lars H. Frandsen, Theodor Nielsen, Jacob Fage-Pedersen, Andrei V. Lavrinenko, Jacob S. Jensen, Ole Sigmund, and Anders Kristensen, "Imprinted silicon-based nanophotonics," Opt. Express 15, 1261-1266 (2007)

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