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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 4 — Feb. 19, 2007
  • pp: 1428–1433

Sub-micron periodic structuring of sapphire by laser induced backside wet etching technique

Stavros Pissadakis, Rico Böhme, and Klaus Zimmer  »View Author Affiliations

Optics Express, Vol. 15, Issue 4, pp. 1428-1433 (2007)

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The periodic structuring of sapphire, by using laser induced backside wet etching technique (LIBWE) and 266 nm, 150 ps Nd:YAG laser radiation, is demonstrated here for first time. Sub-micron period Bragg reflectors are successfully patterned in sapphire wafers using modest energy densities and number of pulses. The gratings are characterized using diffraction efficiency measurements, AFM, and SEM. Issues related to the ablation process and to the phase mask holography are presented and discussed. The experimental results presented depict that the applied method is capable to produce relief structures of depth as deep as 100 nm, while maintaining high resolutions, close to the thermal diffusion length of the material corresponding to the ultrashort pulse duration.

© 2007 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(160.4670) Materials : Optical materials
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Diffraction and Gratings

Original Manuscript: December 21, 2006
Revised Manuscript: January 24, 2007
Manuscript Accepted: January 24, 2007
Published: February 19, 2007

Stavros Pissadakis, Rico Böhme, and Klaus Zimmer, "Sub-micron periodic structuring of sapphire by laser induced backside wet etching technique," Opt. Express 15, 1428-1433 (2007)

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