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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 5 — Mar. 5, 2007
  • pp: 2033–2046

Metrology of replicated diffractive optics with Mueller polarimetry in conical diffraction

Tatiana Novikova, Antonello De Martino, Pavel Bulkin, Quang Nguyen, Bernard Drévillon, Vladimir Popov, and Alexander Chumakov  »View Author Affiliations


Optics Express, Vol. 15, Issue 5, pp. 2033-2046 (2007)
http://dx.doi.org/10.1364/OE.15.002033


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Abstract

The feasibility of metrological characterization of the one-dimensional (1D) holographic gratings, used in the nanoimprint molding tool fabrication step, by spectroscopic Mueller polarimetry in conical diffraction is investigated. The studied samples correspond to two different steps of the replicated diffraction grating fabrication process. We characterized master gratings that consist of patterned resist layer on chromium-covered glass substrate and complementary (replica) gratings made of nickel. The profiles of the gratings obtained by fitting the experimental spectra of Mueller matrix coefficients taken at different azimuthal angles were confirmed by atomic force microscopy (AFM) measurements. The calculated profiles of corresponding master and replica gratings are found to be complementary. We conclude that the Mueller polarimetry, as a fast and non-contact optical characterization technique, can provide the basis for the metrology of the molding tool fabrication step in the nanoimprint technique.

© 2007 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(090.1970) Holography : Diffractive optics
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.3940) Instrumentation, measurement, and metrology : Metrology

ToC Category:
Diffraction and Gratings

History
Original Manuscript: November 29, 2006
Manuscript Accepted: January 22, 2007
Published: March 5, 2007

Citation
Tatiana Novikova, Antonello De Martino, Pavel Bulkin, Quang Nguyen, Bernard Drévillon, Vladimir Popov, and Alexander Chumakov, "Metrology of replicated diffractive optics with Mueller polarimetry in conical diffraction," Opt. Express 15, 2033-2046 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-5-2033


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References

  1. M. Gale, "Replicated Diffractive Optics and Micro-Optics," Opt. Photonic News, 24-29, August (2003). [CrossRef]
  2. A. De Martino, Y. K. Kim, E. Garcia-Caurel, B. Laude, and B. Drévillon, "Optimized Mueller polarimeter with liquid crystals," Opt. Lett. 28, 616-618 (2003). [CrossRef] [PubMed]
  3. B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and John R. McNeil, "Ellipsometric scatterometry for the metrology of Sub-0.1-µm-linewidth structures," Appl. Opt. 37, 5112-5115 (1998). [CrossRef]
  4. Y. -S. Ku, S. -C. Wang, D. -M. Shyu, and N. Smith, "Scatterometry-based metrology with feature region signatures matching," Opt. Express 14, 8482-8491 (2006). [CrossRef] [PubMed]
  5. H.-T. Huang, W. Kong, and F. L. Terry, Jr, "Normal-incidence spectroscopic ellipsometry for critical dimension monitoring," Appl. Phys. Lett. 78, 3983 - 3985 (2001). [CrossRef]
  6. T. Novikova, A. De Martino, R. Ossikovski, and B. Drévillon, "Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics," Eur. Phys. J. Appl. Phys. 31, 63-69 (2005). [CrossRef]
  7. T. Novikova, A. De Martino, S. Ben Hatit, and B. Drévillon, "Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics," Appl. Opt. 45, 3688-3697 (2006). [CrossRef] [PubMed]
  8. A. De Martino, T. Novikova, Ch. Arnold, S. BenHatit, and B. Drévillon, "Decorrelation of fitting parameters by Mueller polarimetry in conical diffraction," in Metrology, Inspection, and Process Control for Microlithography XX, Chas N. Archie, ed., Proc. SPIE 6152, 530-541, (2006).
  9. A. De Martino, E. Garcia-Caurel, B. Laude, and B. Drévillon, "General methods for optimized design and calibration of Mueller polarimeters," Thin Solid Films, 455-456, 112-119, (2004). [CrossRef]
  10. CompOptics Ltd., http://www.compoptics.ru/.
  11. S. Yu. Serezhnikov. "Preparation, treatment and visualization of data for the fabrication of holograms using electron beam system ZBA-21," Numerical Methods and Programming,  3, 110-115 (2002) (in Russian).
  12. M. G. Moharam, E. B. Grann, D. A. Pommet, T. K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995). [CrossRef]
  13. L. Li, "Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings," J. Opt. Soc. Am. A 13, 1024-1035 (1996). [CrossRef]
  14. P. Lalanne and G. M. Morris, "Highly improved convergence of the coupled-wave method for TM polarization," J. Opt. Soc. Am. A 13, 779-784 (1996) [CrossRef]
  15. L. Li, "Use of Fourier series in the analysis of discontinuous periodic structures," J. Opt. Soc. Am. A 13, 1870-1876 (1996). [CrossRef]
  16. L. Li, "Symmetries of cross-polarization diffraction coefficients of gratings," J. Opt. Soc. Am. A 17, 881-887 (2000). [CrossRef]

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