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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 5 — Mar. 5, 2007
  • pp: 2336–2340

High refractive index chalcogenide glass for photonic crystal applications

Kimmo Paivasaari, Victor K. Tikhomirov, and Jari Turunen  »View Author Affiliations


Optics Express, Vol. 15, Issue 5, pp. 2336-2340 (2007)
http://dx.doi.org/10.1364/OE.15.002336


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Abstract

A high refractive index Te-enriched bulk chalcogenide glass Ge20As20Se14Te46 (n≈3.3) has been patterned by ablation using four- and two-beam interference femto-second laser setups operating at 800 nm. The regular arrays of 0.8 μm diameter and more than 0.8 μm depth holes and/or grooves of typical size of 1×1 mm2 have been written on the surface of the glass in a time-scale of 1 second with 50 femtosecond pulses. The high photosensitivity of this narrow-gap semiconductor glass to the femtosecond irradiation is ascribed to a free electron absorption typical of metals, which is caused by laser-induced heating of the glass.

© 2007 Optical Society of America

OCIS Codes
(090.2880) Holography : Holographic interferometry
(160.2750) Materials : Glass and other amorphous materials
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Laser Micromachining

History
Original Manuscript: November 22, 2006
Revised Manuscript: January 21, 2007
Manuscript Accepted: January 22, 2007
Published: March 5, 2007

Citation
Kimmo Paivasaari, Victor K. Tikhomirov, and Jari Turunen, "High refractive index chalcogenide glass for photonic crystal applications," Opt. Express 15, 2336-2340 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-5-2336


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References

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