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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 6 — Mar. 19, 2007
  • pp: 3426–3436

65 nm feature sizes using visible wavelength 3-D multiphoton lithography

Wojciech Haske, Vincent W. Chen, Joel M. Hales, Wenting Dong, Stephen Barlow, Seth R. Marder, and Joseph W. Perry  »View Author Affiliations


Optics Express, Vol. 15, Issue 6, pp. 3426-3436 (2007)
http://dx.doi.org/10.1364/OE.15.003426


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Abstract

Nanoscale features as small as 65 ± 5 nm have been formed reproducibly by using 520 nm femtosecond pulsed excitation of a 4,4’-bis(di-n-butylamino)biphenyl chromophore to initiate crosslinking in a triacrylate blend. Dosimetry studies of the photoinduced polymerization were performed on chromophores with sizable two-photon absorption cross-sections at 520 and 730 nm. These studies show that sub-diffraction limited line widths are obtained in both cases with the lines written at 520 nm being smaller. Three-dimensional multiphoton lithography at 520 nm has been used to fabricate polymeric woodpile photonic crystal structures that show stop bands in the near-infrared spectral region.

© 2007 Optical Society of America

OCIS Codes
(190.4180) Nonlinear optics : Multiphoton processes
(220.3740) Optical design and fabrication : Lithography
(350.3450) Other areas of optics : Laser-induced chemistry

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: January 26, 2007
Revised Manuscript: February 26, 2007
Manuscript Accepted: March 2, 2007
Published: March 19, 2007

Citation
Wojciech Haske, Vincent W. Chen, Joel M. Hales, Wenting Dong, Stephen Barlow, Seth R. Marder, and Joseph W. Perry, "65 nm feature sizes using visible wavelength 3-D multiphoton lithography," Opt. Express 15, 3426-3436 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-6-3426


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