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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 7 — Apr. 2, 2007
  • pp: 4238–4246

Polarization-sensitive printing of surface plasmon interferences

Marianne Derouard, Jérôme Hazart, Gilles Lérondel, Renaud Bachelot, Pierre-Michel Adam, and Pascal Royer  »View Author Affiliations

Optics Express, Vol. 15, Issue 7, pp. 4238-4246 (2007)

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Surface plasmon assisted lithography is currently a matter of growing interest since it allows nanopatterning in photosensitive films without being restricted by the diffraction limit. Using specially designed metallic nanostructures coated with a photosensitive azobenzene-dye polymer, we have generated a plasmon interference field in the polymer layer. The atomic force microscopy observation of the azo-dye polymer surface after exposure exhibits complex topographies which are found to be well explained by an analytically computed surface plasmon interference model that highlights the polarization influence on the pattern shape. The results presented here are believed to be a first step towards a new approach of high resolution plasmonic nanolithography based on the use of longitudinal field components.

© 2007 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(240.6680) Optics at surfaces : Surface plasmons
(260.3160) Physical optics : Interference

ToC Category:
Optics at Surfaces

Original Manuscript: January 19, 2007
Revised Manuscript: February 28, 2007
Manuscript Accepted: March 1, 2007
Published: April 2, 2007

Marianne Derouard, Jérôme Hazart, Gilles Lérondel, Renaud Bachelot, Pierre-Michel Adam, and Pascal Royer, "Polarization-sensitive printing of surface plasmon interferences," Opt. Express 15, 4238-4246 (2007)

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