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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 1 — Jan. 7, 2008
  • pp: 373–383

Light trimming of a narrow bandpass filter based on a photosensitive chalcogenide spacer

W. D. Shen, M. Cathelinaud, M. Lequime, F. Charpentier, and V. Nazabal  »View Author Affiliations


Optics Express, Vol. 16, Issue 1, pp. 373-383 (2008)
http://dx.doi.org/10.1364/OE.16.000373


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Abstract

We present an experimental study of the photosensitive properties of a narrow bandpass filter based on a Ge15Sb20S65 spacer fabricated by electron beam deposition. For a single layer, near the optical bandgap of this chalcogenide material, the efficiency of the photo-bleaching increases as the central wavelength of the light source for exposure decreases. The maximum relative photo-induced change of the optical thickness reaches about 1%. By using controlled light exposure around 480 nm of a photosensitive narrow bandpass filter centered at 1550 nm, we obtained a spatially localized shift of its peak wavelength up to 5.4 nm. This property is used to perform, for the first time at our knowledge, the post trimming of a narrow bandpass filter with a light beam. A 5×5 mm2 ultra uniform area in which the relative spatial variation of its peak wavelength remains below 0.004% is demonstrated.

© 2008 Optical Society of America

OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(160.5335) Materials : Photosensitive materials
(310.6845) Thin films : Thin film devices and applications

ToC Category:
Thin Films

History
Original Manuscript: October 22, 2007
Revised Manuscript: November 26, 2007
Manuscript Accepted: November 26, 2007
Published: January 4, 2008

Citation
W. D. Shen, M. Cathelinaud, M. D. Lequime, F. Charpentier, and V. Nazabal, "Light trimming of a narrow bandpass filter based on a photosensitive chalcogenide spacer," Opt. Express 16, 373-383 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-1-373


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