An error was made in calculating the complex electric field vector for the diffracted beams. We have corrected the error and repeated the optimization to achieve a phase mask design bearing the same result. The overall approach remains unchanged.
© 2008 Optical Society of America
(050.1950) Diffraction and gratings : Diffraction gratings
(220.3740) Optical design and fabrication : Lithography
(220.4610) Optical design and fabrication : Optical fabrication
(260.3160) Physical optics : Interference
(050.5298) Diffraction and gratings : Photonic crystals
(050.6875) Diffraction and gratings : Three-dimensional fabrication
Optical Design and Fabrication
Original Manuscript: May 13, 2008
Published: May 14, 2008
James W. Rinne, Sidhartha Gupta, and Pierre Wiltzius, "Inverse design for phase mask lithography: erratum," Opt. Express 16, 7804-7805 (2008)
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