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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 11 — May. 26, 2008
  • pp: 7804–7805

Inverse design for phase mask lithography: erratum

James W. Rinne, Sidhartha Gupta , and Pierre Wiltzius  »View Author Affiliations


Optics Express, Vol. 16, Issue 11, pp. 7804-7805 (2008)
http://dx.doi.org/10.1364/OE.16.007804


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Abstract

An error was made in calculating the complex electric field vector for the diffracted beams. We have corrected the error and repeated the optimization to achieve a phase mask design bearing the same result. The overall approach remains unchanged.

© 2008 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(220.3740) Optical design and fabrication : Lithography
(220.4610) Optical design and fabrication : Optical fabrication
(260.3160) Physical optics : Interference
(050.5298) Diffraction and gratings : Photonic crystals
(050.6875) Diffraction and gratings : Three-dimensional fabrication

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: May 13, 2008
Published: May 14, 2008

Citation
James W. Rinne, Sidhartha Gupta, and Pierre Wiltzius, "Inverse design for phase mask lithography: erratum," Opt. Express 16, 7804-7805 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-11-7804

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