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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 12 — Jun. 9, 2008
  • pp: 8472–8479

Polarization selective electro-optic polymer waveguide devices by direct electron beam writing

Haishan Sun, Antao Chen, Benjamin C. Olbricht, Joshua A. Davies, Philip A. Sullivan, Yi Liao, Zhengwei Shi, Jingdong Luo, Alex K.-Y. Jen, and Larry R. Dalton  »View Author Affiliations

Optics Express, Vol. 16, Issue 12, pp. 8472-8479 (2008)

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A novel technique for the fabrication of polarization selective electro-optic polymer waveguide devices with direct electron beam writing was described. Birefringence induced by the electric field poling in the electro-optic polymer film was erased in the electron beam exposed regions. The formed waveguides had stronger confinement for the light polarized along the poling direction. High fabrication resolution on the 100 nm scale or smaller could be achieved. Fabrication of polymer polarizer and polarization selective microring resonators with this technique was reported. The highest polarization extinction ratio was measured to be 21.4 dB.

© 2008 Optical Society of America

OCIS Codes
(160.2100) Materials : Electro-optical materials
(230.5750) Optical devices : Resonators
(220.4241) Optical design and fabrication : Nanostructure fabrication
(130.5440) Integrated optics : Polarization-selective devices
(130.5460) Integrated optics : Polymer waveguides

ToC Category:
Integrated Optics

Original Manuscript: February 14, 2008
Revised Manuscript: April 6, 2008
Manuscript Accepted: April 18, 2008
Published: May 27, 2008

Haishan Sun, Antao Chen, Benjamin C. Olbricht, Joshua A. Davies, Philip A. Sullivan, Yi Liao, Zhengwei Shi, Jingdong Luo, Alex K. Jen, and Larry R. Dalton, "Polarization selective electro-optic polymer waveguide devices by direct electron beam writing," Opt. Express 16, 8472-8479 (2008)

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