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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 12 — Jun. 9, 2008
  • pp: 8748–8754

Broadband and omnidirectional antireflection employing disordered GaN nanopillars

C. H. Chiu, Peichen Yu, H. C. Kuo, C. C. Chen, T.C. Lu, S. C. Wang, S. H. Hsu, Y. J. Cheng, and Y. C. Chang  »View Author Affiliations


Optics Express, Vol. 16, Issue 12, pp. 8748-8754 (2008)
http://dx.doi.org/10.1364/OE.16.008748


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Abstract

Disordered GaN nanopillars of three different heights: 300, 550, and 720 nm are fabricated, and demonstrate broad angular and spectral anti-reflective characteristics, up to an incident angle of 60° and for the wavelength range of λ=300–1800nm. An algorithm based on a rigorous coupled-wave analysis (RCWA) method is developed to investigate the correlations between the reflective characteristics and the structural properties of the nanopillars. The broadband and omnidirectional antireflection arises mainly from the refractive-index gradient provided by nanopillars. Calculations show excellent agreement with the measured reflectivities for both s- and p- polarizations.

© 2008 Optical Society of America

OCIS Codes
(310.1210) Thin films : Antireflection coatings
(220.4241) Optical design and fabrication : Nanostructure fabrication
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Thin Films

History
Original Manuscript: February 28, 2008
Revised Manuscript: March 29, 2008
Manuscript Accepted: March 31, 2008
Published: May 30, 2008

Citation
C. H. Chiu, Peichen Yu, H. C. Kuo, C. C. Chen, T. C. Lu, S. C. Wang, S. H. Hsu, Y. J. Cheng, and Y. C. Chang, "Broadband and omnidirectional antireflection employing disordered GaN nanopillars," Opt. Express 16, 8748-8754 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-12-8748


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References

  1. D. S. Hobbs, B. D. MacLeod, and J. R. Riccobono, "Update on the development of high performance anti-reflecting surface relief micro-structures," Proc. SPIE 6545, 65450Y-1-14 (2007). [CrossRef]
  2. G. R. Lin, Y. C. Chang, E. S. Liu, H. C. Kuo, and H. S. Lin, "Low refractive index Si nanopillars on Si substrate," Appl. Phys. Lett. 90, 181923-181925 (2007). [CrossRef]
  3. Y. Kanamori, K.-I. Kobayashi, H. Yugami, and K. Hane, "Subwavelength antireflection gratings for GaSb in visible and near-infrared wavelengths," Jpn. J. Appl. Phys. 42, 4020-4023 (2003). [CrossRef]
  4. Y. Zhao, J. Wang, and G. Mao, "Colloidal subwavelength nanostructures for antireflection optical coatings"Opt. Lett. 30, 1885-1887 (2005). [CrossRef] [PubMed]
  5. S. Nakamura, M. Senoh, S. Nagahama, N. Iwasa, T. Yamada, T. Matsushita, H. Kiyoku, and Y. Sugimoto, "InGaN-Based Multi-Quantum-Well-Structure Laser Diodes," Jpn. J. Appl. Phys. 35, L74-L76 (1996). [CrossRef]
  6. A. Xing, M. Davanco, D. J. Blumenthal, and E. L. Hu, "Fabrication of. 2-D photonic crystal membrane structure," J. Vac. Sci. Tech. B 22, 70-73 (2004). [CrossRef]
  7. C. C. Yu, C. F. Chu, J. Y. Tsai, H. W. Huang, T. H. Hsueh, C. F. Lin, and S. C. Wang, "Gallium Nitride Nanorods Fabricated by Inductively Coupled Plasma Reactive Ion Etching," Jpn. J. Appl. Phys. 41, L910 -L912 (2002). [CrossRef]
  8. W. Q. Han, S. S. Fan, Q. Q. Li, and Y. D. Hu, "Synthesis of Gallium Nitride nanorods through a carbon nanotube-confined reaction," Science 277, 1287-1289 (1997). [CrossRef]
  9. H. M. Kim, D. S. Kim, T. W. Kang, Y. H. Cho, and K. S. Chung, "Growth and characterization of single-crystal GaN nanorods by hydride vapor phase epitaxy," Appl. Phys. Lett. 81, 2193-2195 (2002). [CrossRef]
  10. H. W. Huang, C. C. Kao, T. H. Hsueh, C. C. Yu, C. F. Lin, J. T. Chu, H. C. Kuo, and S. C. Wang, "Fabrication of GaN-based nanorod light emitting diodes using self-assemble nickel nano-mask and inductively coupled plasma reactive ion etching," Mater. Sci. Eng. B 113, 125-129 (2004).
  11. Y. Du, S. Han, W. Jin, C. Zhou, and A. F. J. Levi, "Polarization-dependent reflectivity from dielectric nanowires," Appl. Phys. Lett. 83, 996-998 (2003). [CrossRef]
  12. Y. Kanamori, M. Sasaki, and K. Hane, "Broadband antireflection gratings fabricated upon silicon substrates," Opt. Lett. 24, 1422-1424 (1999). [CrossRef]
  13. C.-C. Chen, P. Yu, J.-C. Yu, and H.-C. Kuo are preparing a manuscript to be called "Angular and Spectral Reflectivity Calculations of Silicon Nano-Textured Surfaces."

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