OSA's Digital Library

Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 12 — Jun. 9, 2008
  • pp: 9106–9111

4X reduction extreme ultraviolet interferometric lithography

Artak Isoyan, A. Wüest, John Wallace, Fan Jiang, and Franco Cerrina  »View Author Affiliations

Optics Express, Vol. 16, Issue 12, pp. 9106-9111 (2008)

View Full Text Article

Enhanced HTML    Acrobat PDF (730 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



We report the initial results from a 4X reduction interferometric lithography technique using extreme ultraviolet (EUV) radiation from a new undulator on the Aladdin storage ring at the Synchrotron Radiation Center of the University of Wisconsin-Madison. We have extended traditional interferometric lithography by using 2nd diffraction orders instead of 1st orders. This change considerably simplifies mask fabrication by reducing the requirements for mask resolution. Interferometric fringes reduced by 4X (from 70 nm half-period grating to 17.5 nm) have been recorded in a 50 nm thick hydrogen silsesquioxane photoresist using 13.4 nm wavelength EUV radiation.

© 2008 Optical Society of America

OCIS Codes
(040.7480) Detectors : X-rays, soft x-rays, extreme ultraviolet (EUV)
(050.0050) Diffraction and gratings : Diffraction and gratings
(110.3175) Imaging systems : Interferometric imaging
(110.4235) Imaging systems : Nanolithography
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Imaging Systems

Original Manuscript: April 14, 2008
Revised Manuscript: May 21, 2008
Manuscript Accepted: May 23, 2008
Published: June 4, 2008

Artak Isoyan, A. Wüest, John Wallace, Fan Jiang, and Franco Cerrina, "4X reduction extreme ultraviolet interferometric lithography," Opt. Express 16, 9106-9111 (2008)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. B. J. Lin, "Sober view on extreme ultraviolet lithography," J. Microlith. Microfab. Microsyst. 5, 033005 (2006), and the references there in. [CrossRef]
  2. E. H. Anderson, K. Komatsu, and H. I. Smith, "Achromatic holographic lithography in the deep ultraviolet," J. Vac. Sci. Technol. B 6, 216 (1988) [CrossRef]
  3. A. Yen, E. H. Anderson, R. A. Ghanbari, M. L. Schattenburg, and H. I. Smith, "Achromatic holographic configuration for 100-nm-period lithography," Appl. Opt. 31, 4540 (1992). [CrossRef] [PubMed]
  4. M. Wei, D. T. Attwood, T. K. Gustafson, and E. H. Anderson, "Patterning a 50-nm Period Grating using Soft Xray Spatial Frequency Multiplication," J. Vac. Sci. Tech.,  12/6, 3648-3652 (1994).
  5. M. L. Schattenburg, C. Chen, P. N. Everett, J. Ferrera, P. Konkola, and H. I. Smith, "Sub-100 nm metrology using interferometrically produced fiducials," J. Vac. Sci. Technol. B 17, 2692-2697 (1999). [CrossRef]
  6. H. H. Solak, D. He, W. Li, S. Singh-Gasson, F. Cerrina, B. H. Sohn, X. M. Yang, and P. Nealey, "Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography," Appl. Phys. Lett. 75, 2328 (1999). [CrossRef]
  7. Y.-C. Cheng, A. Isoyan, J. Wallace, M. Khan, and F. Cerrina, "Extreme Ultraviolet Holographic Lithography: Initial Results," Appl. Phys. Lett. 90, 023116 (2007). [CrossRef]
  8. A. Isoyan, Y.-C. Cheng, F. Jiang, J. Wallace, F. Cerrina, and S. Bollepalli, "Progress in extreme ultraviolet interferometric and holographic lithography," J. Vac. Sci. Technol. B 25, 2145 (2007). [CrossRef]
  9. H. H. Solak, C. David, J. Gobrecht, V. Golovkina, F. Cerrina, S. O. Kim, and P. F. Nealey, "Sub-50 nm period patterns with EUV interference lithography," Microelectron. Eng. 67-68, 56 (2003). [CrossRef]
  10. K. Eidmann, M. Kuhne, P. Muller, and G. D. Tsakiris, "Characterization of pinhole transmission gratings," J. X-Ray Sci. Technol. 2, 259-273 (1990) [CrossRef]
  11. H. W. Schnopper, L. P. Van Speybroeck, J. P. Delvaille, A. Epstein, E. Kallne, R. Z. Bachrach, J. Dijkstra, and L. Lantward, "Diffraction grating transmission efficiencies for XUV and soft x rays," Appl. Opt. 16, 1088 (1977). [PubMed]
  12. M. Born and E. Wolf, Principles of Optics, 7th Edition (Macmillan, New York, 1964), Chap. 8, p. 412.
  13. L. E. Ruggles, M. E. Cuneo, J. L. Porter, D. F. Wenger, and W. W. Simpson, "Measurement of the efficiency of gold transmission gratings in the 100 to 5000 eV photon energy range," Rev. Sci. Instrum. 72, 1218 (2001). [CrossRef]
  14. A. Isoyan, Y.-C. Cheng, F. Jiang, J. Wallace, M. Efremov, P. Nealey, and F. Cerrina, ???Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin," Proc. SPIE 6921, 6921R (2008).
  15. J. Wallacea, Y.-C. Cheng, A. Isoyan, Q. Leonard, M. Fisher, M. Green, J. Bisognano, P. Nealey, and F. Cerrina, "A novel EUV exposure station for nanotechnology studies," Nucl. Instrum. Methods Phys. Res. A 582, 254-257, (2007). [CrossRef]
  16. M. Goldstein, Sematech (private communication).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


Fig. 1. Fig. 2. Fig. 3.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited