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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 13 — Jun. 23, 2008
  • pp: 9501–9506

Widefield subsurface microscopy of integrated circuits

Fatih Hakan Köklü, Justin I. Quesnel, Anthony N. Vamivakas, Stephen B. Ippolito, Bennett B. Goldberg, and M. Selim Ünlü  »View Author Affiliations


Optics Express, Vol. 16, Issue 13, pp. 9501-9506 (2008)
http://dx.doi.org/10.1364/OE.16.009501


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Abstract

We apply the numerical aperture increasing lens technique to widefield subsurface imaging of silicon integrated circuits. We demonstrate lateral and longitudinal resolutions well beyond the limits of conventional backside imaging. With a simple infrared widefield microscope (λ0=1.2µm), we demonstrate a lateral spatial resolution of 0.26µm (0.22λ0) and a longitudinal resolution of 1.24µm (1.03λ0) for backside imaging through the silicon substrate of an integrated circuit. We present a spatial resolution comparison between widefield and confocal microscopy, which are essential in integrated circuit analysis for emission and excitation microscopy, respectively.

© 2008 Optical Society of America

OCIS Codes
(110.0180) Imaging systems : Microscopy
(120.4630) Instrumentation, measurement, and metrology : Optical inspection
(180.1790) Microscopy : Confocal microscopy

ToC Category:
Microscopy

History
Original Manuscript: April 17, 2008
Revised Manuscript: June 6, 2008
Manuscript Accepted: June 9, 2008
Published: June 12, 2008

Virtual Issues
Vol. 3, Iss. 7 Virtual Journal for Biomedical Optics

Citation
Fatih Hakan Köklü, Justin I. Quesnel, Anthony N. Vamivakas, Stephen B. Ippolito, Bennett B. Goldberg, and M. Selim Ünlü, "Widefield subsurface microscopy of integrated circuits," Opt. Express 16, 9501-9506 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-13-9501


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