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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 14 — Jul. 7, 2008
  • pp: 10285–10293

The Characteristics of Optics polished with a polyurethane pad

Yaguo Li, Jing Hou, Qiao Xu, Jian Wang, Wei Yang, and Yinbiao Guo  »View Author Affiliations


Optics Express, Vol. 16, Issue 14, pp. 10285-10293 (2008)
http://dx.doi.org/10.1364/OE.16.010285


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Abstract

The effect of polishing an optical workpiece with a polyurethane pad was studied in this paper, including material removal rate, surface roughness and subsurface damage. Usually, optical polishing pitch is applied to polish optical workpieces, but the material removal rate (MRR) of pitch is quite low, and polyurethane foam is thus substituted for polishing pitch. With the polyurethane pad a much higher MRR was obtained. Surface roughness and subsurface damage of workpieces were also examined. We were gratified to find that there was almost no subsurface damage in the workpieces manufactured with pad polishing and surface roughness was comparable to the result of pitch polishing. Finally, a hypothesis was proposed in an attempt to explain the result that workpieces were defect-free.

© 2008 Optical Society of America

OCIS Codes
(220.4610) Optical design and fabrication : Optical fabrication
(220.5450) Optical design and fabrication : Polishing
(240.6700) Optics at surfaces : Surfaces

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: March 10, 2008
Revised Manuscript: June 9, 2008
Manuscript Accepted: June 16, 2008
Published: June 26, 2008

Citation
Yaguo Li, Jing Hou, Qiao Xu, Jian Wang, Wei Yang, and Yinbiao Guo, "The characteristics of optics polished with a polyurethane pad," Opt. Express 16, 10285-10293 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-14-10285


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References

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