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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 17 — Aug. 18, 2008
  • pp: 12757–12763

Fabrication of large-area patterned porous silicon distributed Bragg reflectors

D. Mangaiyarkarasi, Ow Yueh Sheng, Mark B. H. Breese, Vincent L. S. Fuh, and Eric Tang Xioasong  »View Author Affiliations

Optics Express, Vol. 16, Issue 17, pp. 12757-12763 (2008)

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A process to fabricate porous silicon Bragg reflectors patterned on a micrometer lateral scale over wafer areas of several square centimeters is described. This process is based on a new type of projection system involving a megavolt accelerator and a quadrupole lens system to project a uniform distribution of MeV ions over a wafer surface, which is coated with a multilevel mask. In conjunction with electrochemical anodisation, this enables the rapid production of high-density arrays of a variety of optical and photonic components in silicon such as waveguides and optical microcavities for applications in high-definition reflective displays and optical communications.

© 2008 Optical Society of America

OCIS Codes
(130.0250) Integrated optics : Optoelectronics
(230.1480) Optical devices : Bragg reflectors
(330.1690) Vision, color, and visual optics : Color

ToC Category:
Optical Devices

Original Manuscript: June 9, 2008
Revised Manuscript: August 4, 2008
Manuscript Accepted: August 5, 2008
Published: August 7, 2008

D. Mangaiyarkarasi, Ow Y. Sheng, Mark B. Breese, Vincent L. Fuh, and Eric T. Xioasong, "Fabrication of large-area patterned porous silicon distributed Bragg reflectors," Opt. Express 16, 12757-12763 (2008)

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  1. G. Vincent, "Optical properties of porous silicon superlattices," Appl. Phys. Lett. 64, 2367-2369 (1994). [CrossRef]
  2. L. Pavesi, "Porous silicon dielectric multilayers and microcavities," Riv. Nuovo Cimento 20, 1-78 (1997). [CrossRef]
  3. F. Cunin, T. A. Schmedake, J. R. Link, Y. Y. Li, J. Koh, S. Bhatia and M. J. Sailor, "Biomolecular screening with encoded porous-silicon photonic crystals," Nat. Mater. 1, 39-41 (2002). [CrossRef]
  4. S. M. Weiss, H. Ouyang, J. Zhang, and P. M. Fauchet, Electrical and thermal modulation of silicon photonic bandgap microcavities containing liquid crystals," Opt. Express 13, 1090-1097 (2005) [CrossRef] [PubMed]
  5. V. Lehmann, Electrochemistry of Silicon (Wiley-VCH, Weinheim, Germany 2002). [CrossRef]
  6. D. Mangaiyarkarasi, M. B. H. Breese, Y. S. Ow, and C. Vijila, "Controlled blue-shift of the resonant wavelength in porous silicon microcavities using ion irradiation," Appl. Phys. Lett. 89, 021910 (2006). [CrossRef]
  7. M. B. H. Breese and D. Mangaiyarkarasi, "Porous silicon Bragg reflectors with sub-micrometer lateral dimensions," Opt. Express 15, 5537-5542 (2007). [CrossRef] [PubMed]
  8. M. B. H. Breese, F. J. T. Champeaux, E. J. Teo, A. A. Bettiol, and D. Blackwood, "Hole transport through proton-irradiated p-type silicon wafers during electrochemical anodisation," Phys. Rev. B 73, 035428 (2006). [CrossRef]
  9. M. B. H. Breese, P. J. C. King, P. J. C. Smulders, and G. W. Grime, "Dechanneling of MeV protons by 60º dislocations" Phys. Rev. B 51, 2742-2750 (1995). [CrossRef]
  10. E. Rimini, Ion Implantation: Basics to Device Fabrication, (The International Series in Engineering and Computer Science, Springer 1994)
  11. M. Nastasi and J. W. Mayer, Ion Implantation and Synthesis of Materials (Springer Series in Materials Science by Springer, 2006) [CrossRef]
  12. J. Melngailis, A. A. Mondelli, I. L. Berry and R. Mohondro, "A review of ion projection lithography," J Vac Sci Technol. B 16, 927-957 (1998). [CrossRef]
  13. R. Kaesmaier, A. Ehrmann and H. Loschner, "Ion projection lithography: status of tool and mask developments," Microelectron. Eng. 57-58, 145-153 (2001). [CrossRef]
  14. A. Stephan, J. Meijer, U. Weidenmuller, H. Rocken, H. H. Bukow, M. Burchard, A. Zaitsev, B. Volland, I. W. Rangelow, "The heavy ion micro-projection setup at Bochum," Nucl. Instrum Methods B 181, 39-43 (2001). [CrossRef]
  15. M. B. H. Breese, D. N. Jamieson, and P. J. C. King, Materials Analysis using a Nuclear Microprobe, Wiley, New York, 1996.
  16. M. B. H. Breese, D. N. Jamieson, J. A. Cookson, "Measurement and correction of parasitic sextupole components in magnetic quadrupole lenses," Nucl. Instrum. Methods B 47, 443-452 (1990). [CrossRef]
  17. J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids, (Pergamon Press, New York 1985).

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