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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 17 — Aug. 18, 2008
  • pp: 12757–12763

Fabrication of large-area patterned porous silicon distributed Bragg reflectors

D. Mangaiyarkarasi, Ow Yueh Sheng, Mark B. H. Breese, Vincent L. S. Fuh, and Eric Tang Xioasong  »View Author Affiliations


Optics Express, Vol. 16, Issue 17, pp. 12757-12763 (2008)
http://dx.doi.org/10.1364/OE.16.012757


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Abstract

A process to fabricate porous silicon Bragg reflectors patterned on a micrometer lateral scale over wafer areas of several square centimeters is described. This process is based on a new type of projection system involving a megavolt accelerator and a quadrupole lens system to project a uniform distribution of MeV ions over a wafer surface, which is coated with a multilevel mask. In conjunction with electrochemical anodisation, this enables the rapid production of high-density arrays of a variety of optical and photonic components in silicon such as waveguides and optical microcavities for applications in high-definition reflective displays and optical communications.

© 2008 Optical Society of America

OCIS Codes
(130.0250) Integrated optics : Optoelectronics
(230.1480) Optical devices : Bragg reflectors
(330.1690) Vision, color, and visual optics : Color

ToC Category:
Optical Devices

History
Original Manuscript: June 9, 2008
Revised Manuscript: August 4, 2008
Manuscript Accepted: August 5, 2008
Published: August 7, 2008

Citation
D. Mangaiyarkarasi, Ow Y. Sheng, Mark B. Breese, Vincent L. Fuh, and Eric T. Xioasong, "Fabrication of large-area patterned porous silicon distributed Bragg reflectors," Opt. Express 16, 12757-12763 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-17-12757


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