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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 18 — Sep. 1, 2008
  • pp: 13509–13516

Fabrication of silicon nitride waveguides for visible-light using PECVD: a study of the effect of plasma frequency on optical properties

A. Gorin, A. Jaouad, E. Grondin, V. Aimez, and P. Charette  »View Author Affiliations

Optics Express, Vol. 16, Issue 18, pp. 13509-13516 (2008)

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This paper presents work aimed at optimizing the fabrication of silicon nitride SixNy thin-film visible-light planar waveguides using plasma-enhanced chemical vapour deposition (PECVD). The effects of plasma frequency, precursor gas ratio, and thermal annealing in relation to waveguide optical properties (refractive index, propagation losses) are studied. Experimental results over a wide range of precursor gas ratios show convincingly that waveguides fabricated using low-frequency PECVD have lower propagation losses in the visible range compared to waveguides of equal refractive index fabricated with high-frequency PECVD.

© 2008 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(230.7390) Optical devices : Waveguides, planar
(310.6860) Thin films : Thin films, optical properties

ToC Category:

Original Manuscript: June 30, 2008
Revised Manuscript: August 13, 2008
Manuscript Accepted: August 14, 2008
Published: August 18, 2008

A. Gorin, A. Jaouad, E. Grondin, V. Aimez, and P. Charette, "Fabrication of silicon nitride waveguides for visible-light using PECVD: a study of the effect of plasma frequency on optical properties," Opt. Express 16, 13509-13516 (2008)

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