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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 18 — Sep. 1, 2008
  • pp: 13606–13616

The effects of degraded spatial coherence on ultrafast-laser channel etching

Jesse Dean, Martin Bercx, Felix Frank, Rodger Evans, Santiago Camacho-López, Marc Nantel, and Robin Marjoribanks  »View Author Affiliations


Optics Express, Vol. 16, Issue 18, pp. 13606-13616 (2008)
http://dx.doi.org/10.1364/OE.16.013606


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Abstract

When laser-etching channels through solid targets, the etch-rate is known to decrease with increasing depth, partly because of absorption at the sides of the channel. For ultrafast-laser pulses at repetition rates >100MHz, we show that the etch-rate is also affected by optical properties of the beam: the channel acts as a waveguide, and so the pulses will decompose into dispersive normal modes. Additionally, plasma on the inner surface of the channel will cause scattering of the beam. These effects will cause a loss of spatial coherence in the pulse, which will affect the propagated intensity distribution and ultimately the etch-rate. We have characterized this effect for various foil thicknesses to determine the evolution of the beam while drilling through metal.

© 2008 Optical Society of America

OCIS Codes
(030.1640) Coherence and statistical optics : Coherence
(080.1510) Geometric optics : Propagation methods
(350.3850) Other areas of optics : Materials processing
(350.5400) Other areas of optics : Plasmas

ToC Category:
Coherence and Statistical Optics

History
Original Manuscript: June 3, 2008
Revised Manuscript: July 30, 2008
Manuscript Accepted: August 17, 2008
Published: August 20, 2008

Citation
Jesse Dean, Martin Bercx, Felix Frank, Rodger Evans, Santiago Camacho-López, Marc Nantel, and Robin Marjoribanks, "The effects of degraded spatial coherence on ultrafast-laser channel etching," Opt. Express 16, 13606-13616 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-18-13606


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