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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 19 — Sep. 15, 2008
  • pp: 15228–15237

High performance EUV multilayer structures insensitive to capping layer optical parameters

Maria Guglielmina Pelizzo, Michele Suman, Gianni Monaco, Piergiorgio Nicolosi, and David L. Windt  »View Author Affiliations

Optics Express, Vol. 16, Issue 19, pp. 15228-15237 (2008)

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We have designed and tested a-periodic multilayer structures containing protective capping layers in order to obtain improved stability with respect to any possible changes of the capping layer optical properties (due to oxidation and contamination, for example)-while simultaneously maximizing the EUV reflection efficiency for specific applications, and in particular for EUV lithography. Such coatings may be particularly useful in EUV lithographic apparatus, because they provide both high integrated photon flux and higher stability to the harsh operating environment, which can affect seriously the performance of the multilayer-coated projector system optics. In this work, an evolutive algorithm has been developed in order to design these a-periodic structures, which have been proven to have also the property of stable performance with respect to random layer thickness errors that might occur during coating deposition. Prototypes have been fabricated, and tested with EUV and X-ray reflectometry, and secondary electron spectroscopy. The experimental results clearly show improved performance of our new a-periodic coatings design compared with standard periodic multilayer structures.

© 2008 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

Original Manuscript: March 28, 2008
Revised Manuscript: August 29, 2008
Manuscript Accepted: August 29, 2008
Published: September 12, 2008

Maria Guglielmina Pelizzo, Michele Suman, Gianni Monaco, Piergiorgio Nicolosi, and David L. Windt, "High performance EUV multilayer structures insensitive to capping layer optical parameters," Opt. Express 16, 15228-15237 (2008)

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