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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 2 — Jan. 21, 2008
  • pp: 965–974

High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets

Kai-Chung Hou, Simi George, Aghapi G. Mordovanakis, Kazutoshi Takenoshita, John Nees, Bruno Lafontaine, Martin Richardson, and Almantas Galvanauskas  »View Author Affiliations

Optics Express, Vol. 16, Issue 2, pp. 965-974 (2008)

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In this paper we report the development of nanosecond-pulsed fiber laser technology for the next generation EUV lithography sources. The demonstrated fiber laser system incorporates large core fibers and arbitrary optical waveform generation, which enables achieving optimum intensities and other critical beam characteristics on a laser-plasma target. Experiment demonstrates efficient EUV generation with conversion efficiency of up to 2.07% for in-band 13.5-nm radiation using mass-limited Sn-doped droplet targets. This result opens a new technological path towards fiber laser based high power EUV sources for high-throughput lithography steppers.

© 2008 Optical Society of America

OCIS Codes
(140.3510) Lasers and laser optics : Lasers, fiber
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers

ToC Category:
Lasers and Laser Optics

Original Manuscript: October 2, 2007
Revised Manuscript: December 3, 2007
Manuscript Accepted: December 19, 2007
Published: January 11, 2008

Kai-Chung Hou, Simi George, Aghapi G. Mordovanakis, Kazutoshi Takenoshita, John Nees, Bruno Lafontaine, Martin Richardson, and Almantas Galvanauskas, "High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets," Opt. Express 16, 965-974 (2008)

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