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Optics Express

Optics Express

  • Editor: Martijn de Sterke
  • Vol. 16, Iss. 20 — Sep. 29, 2008
  • pp: 15958–15963

Accurate frequency alignment in fabrication of high-order microring-resonator filters

Jie Sun, Charles W. Holzwarth, Marcus Dahlem, Jeffrey T. Hastings, and Henry I. Smith  »View Author Affiliations


Optics Express, Vol. 16, Issue 20, pp. 15958-15963 (2008)
http://dx.doi.org/10.1364/OE.16.015958


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Abstract

Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6GHz to 0.28 GHz.

© 2008 Optical Society of America

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(220.3740) Optical design and fabrication : Lithography
(230.4000) Optical devices : Microstructure fabrication
(230.5750) Optical devices : Resonators

ToC Category:
Integrated Optics

History
Original Manuscript: July 9, 2008
Revised Manuscript: August 25, 2008
Manuscript Accepted: September 12, 2008
Published: September 23, 2008

Citation
Jie Sun, Charles W. Holzwarth, Marcus Dahlem, Jeffrey T. Hastings, and Henry I. Smith, "Accurate frequency alignment in fabrication of high-order microring-resonator filters," Opt. Express 16, 15958-15963 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-20-15958


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References

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