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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 21 — Oct. 13, 2008
  • pp: 16481–16488

High reflectivity gratings on silicon-on-insulator waveguide facets

J. H. Schmid, P. Cheben, J. Lapointe, S. Janz, A. Delâge, A. Densmore, and D.-X. Xu  »View Author Affiliations

Optics Express, Vol. 16, Issue 21, pp. 16481-16488 (2008)

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We demonstrate by numerical simulations and experiments that highly reflective (HR) facets can be formed on silicon waveguides with high reflectivity diffraction gratings. We use an HR grating with a plane wave reflectivity exceeding 99.99%, as calculated by rigorous coupled wave analysis. Experimentally, we demonstrate the HR effect for silicon-on-insulator waveguide facets patterned lithographically with grating structures. Due to a strong mode size dependence, the maximum facet reflectivity for 1.5 µm thick waveguide is 77%, but finite difference time-domain simulations show that modal reflectivies larger than 90% can be achieved for silicon waveguides with thicknesses of 4 µm or more.

© 2008 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(130.2790) Integrated optics : Guided waves
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Diffraction and Gratings

Original Manuscript: August 15, 2008
Revised Manuscript: September 22, 2008
Manuscript Accepted: September 23, 2008
Published: October 1, 2008

J. H. Schmid, P. Cheben, J. Lapointe, S. Janz, A. Delâge, A. Densmore, and D.-X. Xu, "High reflectivity gratings on silicon-on-insulator waveguide facets," Opt. Express 16, 16481-16488 (2008)

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