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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 21 — Oct. 13, 2008
  • pp: 16877–16888

Si lattice parameter measurement by centimeter X-ray interferometry

Luca Ferroglio, Giovanni Mana, and Enrico Massa  »View Author Affiliations


Optics Express, Vol. 16, Issue 21, pp. 16877-16888 (2008)
http://dx.doi.org/10.1364/OE.16.016877


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Abstract

A combined X-ray and optical interferometer capable of centimeter displacements has been made to measure the lattice parameter of Si crystals to within a 3×10-9 relative uncertainty. This paper relates the results of test measurements carried out to assess the capabilities of the apparatus.

© 2008 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(340.0340) X-ray optics : X-ray optics
(340.7450) X-ray optics : X-ray interferometry

ToC Category:
X-ray Optics

History
Original Manuscript: July 1, 2008
Revised Manuscript: September 1, 2008
Manuscript Accepted: September 19, 2008
Published: October 8, 2008

Citation
Luca Ferroglio, Giovanni Mana, and Enrico Massa, "Si lattice parameter measurement by centimeter X-ray interferometry," Opt. Express 16, 16877-16888 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-21-16877


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References

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