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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 22 — Oct. 27, 2008
  • pp: 17288–17294

SiO2-based nonplanar structures fabricated using femtosecond laser lithography

Hiroaki Nishiyama, Mizue Mizoshiri, Toshio Kawahara, Junji Nishii, and Yoshinori Hirata  »View Author Affiliations

Optics Express, Vol. 16, Issue 22, pp. 17288-17294 (2008)

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SiO2-based hybrid diffractive-refractive microlenses were fabricated by femtosecond laser lithography-assisted micromachining, which is a combined process of nonlinear lithography and plasma etching. The high-aspect-ratio patterns of resist were formed by laser exposure without translating the laser spot. By scanning this rod three-dimensionally, micro-Fresnel lens patterns were written directly inside resists on the convex lenses. Then, the resist patterns were transferred to the underlying lenses by CHF3 plasma. We obtained SiO2 nonplanar structures with smooth surfaces. This hybridization shifted the focal length of the lens by 216 µm, which was consistent with theoretical value.

© 2008 Optical Society of America

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(190.4180) Nonlinear optics : Multiphoton processes
(220.4610) Optical design and fabrication : Optical fabrication
(230.1950) Optical devices : Diffraction gratings

ToC Category:
Laser Micromachining

Original Manuscript: August 20, 2008
Revised Manuscript: September 16, 2008
Manuscript Accepted: September 18, 2008
Published: October 13, 2008

Hiroaki Nishiyama, Mizue Mizoshiri, Toshio Kawahara, Junji Nishii, and Yoshinori Hirata, "SiO2-based nonplanar structures fabricated using femtosecond laser lithography," Opt. Express 16, 17288-17294 (2008)

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